Step-Covertage Characteristics of Silicon-Dioxide Films Formed by a New Low-Temperature Chemical-Vapor-Deposition Method
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-08-01
著者
-
松村 正清
東京工業大学工学部:(現)(株)液晶先端技術開発センター
-
Matsumura Masakiyo
Department of Physical Electronics, Tokyo Institute of Technology
-
UCHIDA Yasutaka
Department of Electronics and Information Science, Teikyo University of Science and Technology
-
TAKEI Shu
Department of Electronics and Information Science, Teikyo University of Science and Technology
-
松村 正清
東京工業大学工学部電子物理科
-
Matsumura Masakiyo
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
-
Uchida Y
Aichi Inst. Technol. Toyota Jpn
-
Takei Shu
Department Of Electronics And Information Science Teikyo University Of Science And Technology
-
Uchida Y
Department Of Electrical Engineering Aichi Institute Of Technology Toyota
-
Uchida Y
Yamaguchi Univ. Yamaguchi Jpn
-
Uchida Yasutaka
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
関連論文
- 次世代Si薄膜デバイスを目指した超巨大結晶粒形成法
- エキシマレーザを用いた巨大結晶粒Si薄膜の形成
- 次世代Si薄膜デバイスを目指した超巨大結晶粒形成法
- Two-Dimensionally Position-Controlled Excimer-Laser-Crystallization of Silicon Thin Films on Glassy Substrate
- A Proposed Organic-Silica Film for Inter-Metal-Dielectric Application
- プレナリー講演1 ジャイアントマイクロエレクトロニクス : 過去から未来へ
- プレナリー講演1 ジャイアントマイクロエレクトロニクス : 過去から未来へ
- Preparation of Position-Controlled Crystal-Silicon Island Arrays by Means of Excimer-Laser Annealing
- 薄膜トランジスタの研究と開発
- A Novel Phase-Modulated Excimer-Laser Crystallization Method of Silicon Thin Films
- Preparation of Organic Silica Films with Low Dielectric Constant from the Liquid Phase
- Excimer-Laser-Induced Lateral-Growth of Silicon Thin-Films
- Excimer-Laser-Produced Single-Crystal Silicon Thin-Film Transistors
- Step-Covertage Characteristics of Silicon-Dioxide Films Formed by a New Low-Temperature Chemical-Vapor-Deposition Method
- Chemical Vapor Deposition of Hydrogen-Free Silicon-Dioxide Films
- 薄膜トランジスタ-創生から未来まで-
- Low-Temperature CVD of Silicon Dioxide by Alkoxyl-Silane-Isocyanate
- エキシマレーザのディスプレイ作製技術への応用
- Low-Temperature CVD of SiO_2 by Alkoxy-Silane-Iso-Cyanate
- Chemical Vapor Deposition of Amorphous Silicon Using Tetrasilane
- Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films
- Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas : Hydrogen Azide
- Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
- The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by Chemical-Vapor-Deposition Method
- Chemical Vapour Deposition of Amorphous Silicon with Silanes for Thin Film Transistors : The Influence of the Amorphous Silicon Deposition Temperature
- Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
- Optimization of Chemical Vapor Deposition Conditions of Amorphous-Silicon Films for Thin-Film Transistor Application
- Amorphous-Silicon Thin-Film Transistors Using Chemical Vapor Deposition of Disilane
- Amorphous-Silicon Thin-Film Transistors with Silicon Dioxide Gate Grown in Nitric-Acid Gas
- Normal-Pressure and Low-Temperature Thermal Oxidation of Silicon
- アモルファスシリコン薄膜トランジスタへのポスト水素化の効果
- Diagnostic Study of VHF Plasma and Deposition of Hydrogenated Amorphous Silicon Films
- Generation of Electron Cyclotron Resonance Plasma in the VHF Band
- 安定共振器を伴った不安定共振器
- An Experimental Investigation of the Novel Unstable Resonator with a Stable Resonator Core
- シリコン薄膜の振幅・位相制御エキシマレーザ溶融再結晶化法 : 新しい2-D位置制御大結晶粒形成法(低温または高温多結晶Siとアクティブマトリックス型ディスプレイ用薄膜トランジスタ論文特集)
- Interfacial Layer in Thermally-grown Ultra thin Silicon Dioxides Measured by Grazing Incidence X-Ray Reflection
- Surface Preparation, Growth, and Interface Control of Ultrathin Gate Oxides
- Atomic Layer Etching of Silicon by Thermal Desorption Method
- Chemical Vapor Deposition Based Preparation on Porous Silica Films
- Atomic-Layer Epitaxy of Silicon on(100)Surface
- Hetero Atomic-Layer Epitaxy of Ge on Si(100)
- A Fluorinated Organic-Silica Film with Extremely Low Dielectric Constant
- Chemical-Vapor Deposition of OH-free and Low-k Organic-Silica Films
- Formation of an Atomically Abrupt Si/Ge Hetero-Interface
- Formation of Atomically Abrupt Si/Ge Hetero-Interface
- A Proposed Atomic-Layer-Deposition of Germanium on Si Surface
- A Proposed Atomic-Layer-Deposition of Germanium on Si(100)
- 細線構造を用いたSiの位置制御エキシマレーザ結晶化
- 水素フリー低温CVDSiO_2膜の最適成膜条件
- Lateral Growth of Poly-Si Film by Excimer Laser and Its Thin Film Transistor Application
- Drastic Enlargement of Grain Size of Excimer-Laser-Crystallized Polysilicon Films
- Evaluation of Deep States in Amorphous-Silicon / Silicon-Nitride System from Charge-Coupled Device Characteristics : Semiconductors and Semiconductors Devices
- p-Channel Amorphous Silicon Thin-Film Transistors with High Hole Mobility : Semiconductors and Semiconductor Devices
- Numerical Analysis of the Dynamic Characteristics of Amorphous Silicon Thin-Film Transistors : Semiconductors and Semiconductor Devices
- Fabrication of Nanostructure by Anisotropic Wet Etching of Silicon : Techniques, Instrumentations and Measurement
- TFTとその応用
- A Fluorinated Organic-Silica Film with Extremely Low Dielectric-Constant
- 応用物理学会の現状と課題
- Vertical-Type Amorphous-Silicon Field-Effect Transistors with Small Parasitic Elements
- Low-Temperature Thermal-Oxidation of Silicon
- Electronic Structures of Si-Based Manmade Crystals
- Newly Designed Hg Cell for Molecular Beam Epitaxy Growth of CdHgTe
- Excimer-Laser Annealing Technology for Hydrogenated Amorphous-Silicon Devices
- Low-Temperature Chemical-Vapor-Deposition of Silicon-Nitride Film from Hexachloro-Disilane and Hydrazine
- Effects of Light Pulse Duration on Excimer-Laser Crystallization Characteristics of Silicon Thin Films
- Measurement of Electron Mobility in Hydrogenated Amorphous-Silicon Using 4-Terminal Transistor Structures
- Proposed Planar-Type Amorphous-Silicon MOS Transistors
- A New Nucleation-Site-Control Excimer-Laser-Crystallization Method
- A New Thermal-Oxidation Method for III-V Semiconductors
- Application of Hydrogenated Amorphous-Silicon to Bipolar Transistors
- High-Performance Poly-Si Thin-Film Transistors with Excimer-Laser Annealed Silicon-Nitride Gate
- High-Mobility Bottom-Gate Thin-Film Transistors with Laser-Crystallized and Hydrogen-Radical-Annealed Polysilicon Films
- 1 μm-Long Amorphous-Silicon Thin-Film Transistors with Wide Dynamic Range
- サブミクロンチャネルアモルファスシリコン薄膜トランジスタ : 情報ディスプレイ
- サブミクロンチャネルアモルファスシリコン薄膜トランジスタ
- A Novel Double-Pulse Excimer-Laser Crystallization Method of Silicon Thin-Films
- Fully Self-Aligned Amorphous-Silicon MUS Transistors
- Theoretical Analysis of Amorphous-Silicon Field-Effect-Transistors
- Application of Amorphous-Silicon Field-Effect Transistors in Three-Dimensional Integrated Circuits
- Excimer-Laser-Produced Amorphous-Silicon Vertical Thin-Film Transistors
- The Annealing Effects of Excimer-Laser-Produced Large-Grain Poly-Si Thin-Film Transistors
- Electrical Properties of Ultralarge Grairn Polycrystalline Silicon Film Produced by Exeimer-Laser Recrystallization Method
- Characterization of Distributed-Threshold-Voltage Transistors with Amorphous-Silicon
- Liquid-Phase Deposition of Silicon-Dioxide Films using Tetra-Ethyl Orthosilicate
- Low-Temperature Thermal-Oxidation of Amorphous-Silicon and Its Application to Amorphous-Silicon MOS Transistors
- TFT-技術の変遷からその未来を測る
- Atomic-Layer Chemical-Vapor-Deposition of SiO_2 by Cyclic Exposures of CH_3OSi(NCO)_3 and H_2O_2
- A Novel Atomic Layer Epitaxy Method of Silicon
- High-Mobility Amorphous-Silicon MUS Transistors
- Transient Temperature Profiles in Silicon Films during Pulsed Laser Annealing
- On-Chip Bottom-Gate Polysilicon and Amorphous Silicon Thin-Film Transistors Using Excimer Laser Annealing
- Ultra-Thin Amorphous-Silicon Transistors Fabricated by Two-Step Deposition Method
- Sub-Atomic Layer Growth of SiC at Low Temperatures
- Excimer-Laser Crystallization of Silicon-Carbon Films and Their Thin-Film Transistor Application
- Semi-Insulating Polysilicon Thin-Film Transistor: A Proposed Thin-Film Transistor
- Two-Dimensional Numerical Analysis of Amorphous-Silicon Field-Effect Transistors
- Chemical Vapor Deposition of Nickel Oxide Films from Bis-π-Cyclopentadienyl-Nickel
- Preparation of Giant-Grain Seed Layer for Poly-Silicon Thin-Film Solar Cells
- A Novel Post-Hydrogenation Process for Chemical-Vapor-Deposited a-Si Thin-Film Transistors