Chemical Vapor Deposition of Nickel Oxide Films from Bis-π-Cyclopentadienyl-Nickel
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概要
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Bis-π-cyclopentadienyl nickel has been proposed as a source material for metalorganic chemical vapor deposition of nickel oxide films. The transparent film deposited at 310℃ was of a NaCl-type crystal structure of NiO. The refractive index and optical bandgap were approximately 2.1 and 3.7 eV, respectively.
- 社団法人応用物理学会の論文
- 1997-11-15
著者
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Matsumura Masakiyo
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Yeh Wen-chang
Department Of Physical Electronics Faculty Of Engineering Tokyo Institute Of Technology
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MATSUMURA Masakiyo
Department of Physical Electronics, Faculty of Engineering, Tokyo Institute of Technology
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