Amorphous-Silicon Thin-Film Transistors with Silicon Dioxide Gate Grown in Nitric-Acid Gas

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-01-20

著者

• Zhang H

  Tsinghua Univ. Beijing Chn

• Kanoh Hiroshi

  Department of Cardiology, Oume City General Hospital

• Matsumura Masakiyo

  Department of Physical Electronics, Tokyo Institute of Technology

• Kanoh Hiroshi

  Department Of Physical Electronics Tokyo Institute Of Technology:(present Address)display Device Res

• Kanoh Hiroshi

  Functional Devices Research Laboratories Nec Corporation

• SUGIURA Osamu

  Department of Physical Electronics, Tokyo Institute of Technology

• ZHANG Hongyong

  Department of Physical Electronics, Tokyo Institute of Technology

• YAMAJI Shunji

  Department of Physical Electronics, Tokyo Institute of Technology

• Zhang H

  Shandong Univ. Jinan Chn

• Matsumura Masakiyo

  Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology

• Zhang Hongyong

  Department Of Physical Electronics Tokyo Institute Of Technology

• Yamaji Shunji

  Development Department Mitsubishi Electric Corporation

• 杉浦 修

  Tokyo Inst. Technol. Tokyo Jpn

• Sugiura Osamu

  Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology

• Zhang Hankun

  Graduate School Of Decision Science And Technology Tokyo Institute Of Technology

• Kanoh Hiroshi

  Department Of Cardiology Oume City Hospital

• Zhang Hankun

  State Key Laboratory of Crystal Materials and Institute of Crystal Materials

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