The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by Chemical-Vapor-Deposition Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-15
著者
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Kanoh Hiroshi
Department of Cardiology, Oume City General Hospital
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Matsumura Masakiyo
Department of Physical Electronics, Tokyo Institute of Technology
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SATOH Tsutomu
Department of Cardiology, Koshigawa Hospital, Dokkyo University School of Medicine
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Kanoh Hiroshi
Department Of Physical Electronics Tokyo Institute Of Technology:(present Address)display Device Res
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Kanoh Hiroshi
Functional Devices Research Laboratories Nec Corporation
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SUGIURA Osamu
Department of Physical Electronics, Tokyo Institute of Technology
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Matsumura Masakiyo
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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SATOH Takamasa
Fujitsu Limited
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Satoh T
Fujitsu Limited
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杉浦 修
Tokyo Inst. Technol. Tokyo Jpn
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Sugiura Osamu
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Kanoh Hiroshi
Department Of Cardiology Oume City Hospital
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SATOH Tsutomu
Department of Bioproduction, Faculuction, Faculty of Agriculture, Yamagata University
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