LCD Legibility as a Function of Resolution (Special Issue on Electronic Displays)

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概要

• 論文の詳細を見る

• We proposed a new method to evaluate display legibility as a function of resolution. This method was able to evaluated display legibility without being restricted to the display resolution. Using this method, subjective psychological experiments were carried out to investigate display resolution, which provides legibility, in observing small characters. Samples viewed by subjects were images displayed on a high-resolution TFT-LCD that we developed, CRT images and printed documents for comparison. We have found that TFT-LCD legibility was much better than that of CRT, and that minimum resolution of about 175 dpi was needed for use in legible document viewers.

• 社団法人電子情報通信学会の論文
• 1999-10-25

著者

• Kanoh Hiroshi

  Department Of Physical Electronics Tokyo Institute Of Technology:(present Address)display Device Res

• Kanoh Hiroshi

  Functional Devices Research Laboratories Nec Corporation

• NOSE Takashi

  Functional Devices Research Laboratories, NEC Corporation

• IKEDA Naoyasu

  Functional Devices Research Laboratories, NEC Corporation

• IKENO Hidenori

  Functional Devices Research Laboratories, NEC Corporation

• HAYAMA Hiroshi

  Functional Devices Research Laboratories, NEC Corporation

• KANEKO Setsuo

  Functional Devices Research Laboratories, NEC Corporation

• Kaneko Setsuo

  Functional Devices Research Laboratories Nec Corporation

• Kaneko Setsuo

  Functional Devices And Material Research Nec Corporation

• Ikeda Naoyasu

  Functional Devices Research Laboratories Nec Corporation

• Ikeno Hidenori

  Functional Devices Research Laboratories Nec Corporation

• Hayama H

  Nec Corp. Kawaki Jpn

• Hayama Hiroshi

  Functional Devices And Material Research Nec Corporation

• Nose T

  Functional Devices Research Laboratories Nec Corporation

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• Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films
• Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas : Hydrogen Azide
• Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
• The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by Chemical-Vapor-Deposition Method
• Chemical Vapour Deposition of Amorphous Silicon with Silanes for Thin Film Transistors : The Influence of the Amorphous Silicon Deposition Temperature
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• Optimization of Chemical Vapor Deposition Conditions of Amorphous-Silicon Films for Thin-Film Transistor Application
• Amorphous-Silicon Thin-Film Transistors Using Chemical Vapor Deposition of Disilane
• Amorphous-Silicon Thin-Film Transistors with Silicon Dioxide Gate Grown in Nitric-Acid Gas
• Normal-Pressure and Low-Temperature Thermal Oxidation of Silicon
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