Fabrication of Nanostructure by Anisotropic Wet Etching of Silicon : Techniques, Instrumentations and Measurement
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-09-20
著者
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ODA Shunri
Department of Physical Electronics and Quantum Nanoelectronics Research Center, Tokyo Institute of T
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Shimizu Kazuhiro
Departments Of Cardiovascular Center Sakura Medical Center School Of Medicine Toho University
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Matsumura Masakiyo
Department of Physical Electronics, Tokyo Institute of Technology
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Shimizu Kazuhiro
Department Of Dermatology Nagasaki University Graduate School Of Biomedical Sciences
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Matsumura Masakiyo
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Oda Shunri
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
関連論文
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- Preparation of Position-Controlled Crystal-Silicon Island Arrays by Means of Excimer-Laser Annealing
- A Novel Phase-Modulated Excimer-Laser Crystallization Method of Silicon Thin Films
- Preparation of Organic Silica Films with Low Dielectric Constant from the Liquid Phase
- Excimer-Laser-Induced Lateral-Growth of Silicon Thin-Films
- Excimer-Laser-Produced Single-Crystal Silicon Thin-Film Transistors
- Step-Covertage Characteristics of Silicon-Dioxide Films Formed by a New Low-Temperature Chemical-Vapor-Deposition Method
- Chemical Vapor Deposition of Hydrogen-Free Silicon-Dioxide Films