Selective Etching of Hydrogenated Amorphous Silicon by Hydrogen Plasma (<Special Issue> Plasma Processing)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• 小田 俊理

  東工大工

• ODA Shunri

  Department of Physical Electronics and Quantum Nanoelectronics Research Center, Tokyo Institute of T

• 小田 俊理

  東京工業大学量子ナノエレクトロニクス研究センター

• Masuda Kohzoh

  Material Science Tsukuba University

• Oda S

  Tokyo Inst. Technol. Tokyo Jpn

• Oda Shunri

  Research Center For Quantum Effect Electronics And Department Of Physical Electronics Tokyo Institut

• Oda Shunri

  The Graduate School At Nagatsuta Tokyo Institute Of Technology

• OTOBE Masanori

  Department of Physical Electronics, Tokyo Institute of Technology

• KIMURA Masao

  Department of Physical Electronics, Tokyo Institute of Technology

• Kimura M

  Murata Mfg. Co. Ltd.

• Oda Shunri

  Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology

• Miyamura Kazuo

  Department Of Applied Chemistry Faculty Of Engineering The University Of Tokyo

• Otobe M

  Research Center For Quantum Effect Electronics And Department Of Physical Electronics Tokyo Institut

• Otobe Masanori

  Department Of Physical Electronics Tokyo Institute Of Technology

• Kimura Masao

  Department Of Ocean Engineering Faculty Of Marine Science And Technology Tokai University

• Kimura Masao

  Department Of Naval Architecture Faculty Of Engineering Yokohama National Univ.

• KIMURA Masao

  Department of Chemistry, Faculty of Sience, Hokkaido University

• Kimura Masao

  Department of Chemistry Nagoya University

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