Nanometer Patterning by Electron Beam Lithography Using an Amorphous Carbon Film as an Intermediate Layer
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-04-15
著者
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ODA Shunri
Department of Physical Electronics and Quantum Nanoelectronics Research Center, Tokyo Institute of T
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Shimizu Kazuhiro
Departments Of Cardiovascular Center Sakura Medical Center School Of Medicine Toho University
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Shimizu Kazuhiro
Department Of Physical Electronics Tokyo Institute Of Technology
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Shimizu Kazuhiro
Department Of Dermatology Nagasaki University Graduate School Of Biomedical Sciences
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Oda Shunri
Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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NAKAKITA Hideaki
Department of Physical Electronics, Tokyo Institute of Technology
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Nakakita Hideaki
Department Of Physical Electronics Tokyo Institute Of Technology
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Shimizu Kazuhiro
Department of Cardiovascular Center, Sakura Hospital, Toho University Medical Center
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