Threshold Voltage Instability in nMOSFETs with HfSiO/SiO_2 High-k Gate Stacks
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Wu Wei-hao
Department Of Electronics Engineering National Chiao Tung University
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Liang M‐s
Taiwan Semiconductor Manufacturing Co. Hsinchu Twn
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Chen S‐c
Industrial Technol. Res. Inst. Hsinchu Twn
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Chen Shih-chang
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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CHEN Mao-Chieh
Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung University
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Chen Mao-chieh
Department Of Electronics Engineering National Chiao Tung University
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TSUI Bing-Yue
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Liang Mong-song
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Liang Mong-song
Taiwan Semiconductor Manufacturing Company
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HOU Yong-Tian
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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JIN Yin
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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TAO Hun-Jan
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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Tsui Bing-yue
Department Of Electronics Engineering National Chiao Tung University
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Tsui Bing-yue
Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung University
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Jin Yin
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Tao Hun-jan
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Hou Yong-tian
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Chen S‐c
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Wu Wei-hao
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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