Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited $\alpha$-SiC:H Films from Trimethylsilane and Tetramethylsilane

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概要

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• This work investigates the thermal stability and physical and barrier properties of two species of plasma-enhanced chemical vapor deposited (PECVD) $\alpha$-SiC:H silicon carbide films (with $k$-values less than 5) deposited using trimethylsilane, (CH3)3SiH (3MS) and tetramethylsilane, (CH3)4Si (4MS) organosilicate gases. It is found that the 4MS $\alpha$-SiC:H film contains a higher content of carbon and has a lower dielectric constant. Both of the 3MS and 4MS $\alpha$-SiC:H films are thermally stable at temperatures up to 500°C. However, degraded barrier property and moisture resistance were observed for the 4MS $\alpha$-SiC:H film; this is attributed to the porosity enrichment caused by the film's high carbon content. The 3MS $\alpha$-SiC:H film, which exhibits a superior Cu-barrier property, is a potential candidate for replacing the higher dielectric constant Si3N4 film as a Cu-cap barrier and etching stop layer in the Cu damascene structure.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-07-15

著者

• Wu Zhen-cheng

  Taiwan Semiconductor Manufacturing Company

• CHEN Mao-Chieh

  Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung University

• Liang Mong-song

  Taiwan Semiconductor Manufacturing Co. Ltd.

• KO Chung-Chi

  Taiwan Semiconductor Manufacturing Company

• JANG Syun-Ming

  Taiwan Semiconductor Manufacturing Company

• Chiang Chiu-chih

  Department Of Electronics Engineering National Chiao-tung University

• Wu Zhen-Cheng

  Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan

• Chen Mao-Chieh

  Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan

• Chiang Chiu-Chih

  Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan

• Ko Chung-Chi

  Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan

• Liang Mong-Song

  Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan

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