Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC : H Films from Trimethylsilane and Tetramethylsilane
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-07-15
著者
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Wu Zhen-cheng
Taiwan Semiconductor Manufacturing Company
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Liang M‐s
Taiwan Semiconductor Manufacturing Co. Hsinchu Twn
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CHEN Mao-Chieh
Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung University
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LIANG Mong-Song
Taiwan Semiconductor Manufacturing Co., Ltd.
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Liang Mong-song
Taiwan Semiconductor Manufacturing Company
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CHIANG Chiu-Chih
Department of Electronics Engineering, National Chiao-Tung University
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KO Chung-Chi
Taiwan Semiconductor Manufacturing Company
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JANG Syun-Ming
Taiwan Semiconductor Manufacturing Company
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Chiang Chiu-chih
Department Of Electronics Engineering National Chiao-tung University
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