Wu Zhen-cheng | Taiwan Semiconductor Manufacturing Company
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概要
関連著者
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Wu Zhen-cheng
Taiwan Semiconductor Manufacturing Company
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CHEN Mao-Chieh
Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung University
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Chiang Chiu-chih
Department Of Electronics Engineering National Chiao-tung University
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Liang M‐s
Taiwan Semiconductor Manufacturing Co. Hsinchu Twn
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Liang Mong-song
Taiwan Semiconductor Manufacturing Company
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CHIANG Chiu-Chih
Department of Electronics Engineering, National Chiao-Tung University
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KO Chung-Chi
Taiwan Semiconductor Manufacturing Company
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JANG Syun-Ming
Taiwan Semiconductor Manufacturing Company
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LIANG Mong-Song
Taiwan Semiconductor Manufacturing Co., Ltd.
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WU Zhen-Cheng
Department of Electronics Engineering, National Chiao-Tung University
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Wu Wei-hao
Department Of Electronics Engineering National Chiao Tung University
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Liang Mong-song
Taiwan Semiconductor Manufacturing Co. Ltd.
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CHEN Hsi-Ping
Taiwan Semiconductor Manufacturing Company
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YU Chen-Hua
Taiwan Semiconductor Manufacturing Company
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LI Lain-Jong
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufact
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JANG Syun-Ming
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufact
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LIANG Mong-Song
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufact
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Wu Zhen-Cheng
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan
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Chen Mao-Chieh
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Chiang Chiu-Chih
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Ko Chung-Chi
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan
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Liang Mong-Song
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan
著作論文
- Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition α-SiC : N : H Films
- Effects of O_2- and N_2-Plasma Treatments on Copper Surface
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC : H Films from Trimethylsilane and Tetramethylsilane
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited $\alpha$-SiC:H Films from Trimethylsilane and Tetramethylsilane