CHEN Mao-Chieh | Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung University
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概要
- 同名の論文著者
- Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung Universityの論文著者
関連著者
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CHEN Mao-Chieh
Department of Electronics Engineering & The Institute of Electronics, National Chiao Tung University
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Chiang Chiu-chih
Department Of Electronics Engineering National Chiao-tung University
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Liang M‐s
Taiwan Semiconductor Manufacturing Co. Hsinchu Twn
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Liang Mong-song
Taiwan Semiconductor Manufacturing Company
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KO Chung-Chi
Taiwan Semiconductor Manufacturing Company
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JANG Syun-Ming
Taiwan Semiconductor Manufacturing Company
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Wu Zhen-cheng
Taiwan Semiconductor Manufacturing Company
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LIANG Mong-Song
Taiwan Semiconductor Manufacturing Co., Ltd.
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Liang Mong-song
Taiwan Semiconductor Manufacturing Co. Ltd.
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CHIANG Chiu-Chih
Department of Electronics Engineering, National Chiao-Tung University
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YU Chen-Hua
Taiwan Semiconductor Manufacturing Company
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Wu Wei-hao
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Chen Shih-chang
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Tsai Ming-hsing
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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LIN Mou-Shiung
Taiwan Semiconductor Manufacture Company
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Lin Cheng-li
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Wang Chao-chun
Department Of Electronics Engineering National Chiao-tung University
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Chiang Chiu-Chih
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Lin Cheng-li
Department of Electronic Engineering, Feng Chia University, Taichung, Taiwan 407, Republic of China
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Wu Wei-hao
Department Of Electronics Engineering National Chiao Tung University
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Lin C‐l
National Chiao‐tung Univ. Hsinchu Twn
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Chen S‐c
Industrial Technol. Res. Inst. Hsinchu Twn
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YEH Wen-Kuan
Department of Electrical Engineering, National University of Kaohsiung
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CHANG Ting-Chang
Department of Physics, National Sun Yat-Sen University
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Chen Mao-chieh
Department Of Electronics Engineering National Chiao Tung University
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Chen Mao-chieh
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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CHEN Sheng-Hsiung
Department of Electronics Engineering and Inst. of Electronics, National Chiao Tung University
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Liang Mong-song
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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WU Zhen-Cheng
Department of Electronics Engineering, National Chiao-Tung University
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CHEN Hsi-Ping
Taiwan Semiconductor Manufacturing Company
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JANG Syun-Ming
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufact
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LIANG Mong-Song
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufact
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Tsui Bing-yue
Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung University
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Jin Yin
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Tao Hun-jan
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Hou Yong-tian
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Yeh Wen-kuan
Department Of Electrical Engineering National University Of Kaohsiung
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HSU Wei-Cheng
Department of Electronics Engineering, National Chiao Tung University
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Yeh W‐k
National Univ. Kaohsiung Kaohsiung Twn
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CHAN Kuang-Yang
Department of Electronics Engineering, National Chiao Tung University and National Nano Device Labor
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Lin Mou-shiung
Asia Pacific Microsystems Inc.
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Chan K‐y
Nankai Univ. Tianjin Chn
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LIN Cheng-Li
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Chang Ting-chang
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Chan Kuang-yang
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Hsu Wei-cheng
Department Of Electronics Engineering National Chiao Tung University
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Chen Sheng-hsiung
Department Of Electrical Engineer Tung Fang Institute Of Technology
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Chen Mao-Chieh
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Wu Wei-Hao
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Wu Zhen-Cheng
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park, Hsinchu 300, Taiwan
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Tsai Ming-Hsing
Department of Electronic Engineering, National University of Kaohsiung, No. 700, Kaohsiung University Road, NanTzu District, Kaohsiung, Taiwan 811, R.O.C.
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Fan C‐l
National Huwei Inst. Of Technol. Yunlin Twn
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Yang Fann-mei
Department Of Electronics Engineering & The Institute Of Electronics National Chiao Tung Univers
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Lin Cheng-tang
R&d Department Taiwan Semiconductor Manufacturing Company Science-based Industrial Park
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Lin Hsin-hung
Department Of Electronics Engineering National Chiao-tung University
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Chen M‐c
National Chiao‐tung Univ. Hsinchu Twn
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TSUI Bing-Yue
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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HOU Yong-Tian
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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JIN Yin
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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TAO Hun-Jan
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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LI Lain-Jong
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufact
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Tsui Bing-yue
Department Of Electronics Engineering National Chiao Tung University
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Chen S‐c
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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CHEN Shih-Chang
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park
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LIANG Mong-Song
R&D Department, Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park
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LIN Cheng-Tang
R&D Department, Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park
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Chen M‐c
Department Of Electronics Engineering National Chiao Tung University
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Lin Pi-jiun
Department Of Electronics Engineering National Chiao Tung University
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Hsu Wei-cheng
Materials Research Laboratory
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Fan Ching-lin
Department Of Electronics Engineering & Institute Of Electronics National Chiao-tung University
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Fan Ching-lin
Institute Of Electro-optical And Material Science National Huwei Institute Of Technology
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KU Shaw-Ru
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Ku Shaw-ru
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Chang Yih
Ritdisplay Corporation
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CHEN Peng-Sen
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Chen Shih-chang
Taiwan Semiconductor Manufacturing Company
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Liang Mong-song
R&d Department Taiwan Semiconductor Manufacturing Company Science-based Industrial Park
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Li Lain-jong
Department Of Chemistry National Taiwan University
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Lin Mou-shiung
Taiwan Semiconductor Manufacturing Company
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Yeh Wen-kuan
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Chen Peng-sen
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Chen Mao-chieh
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Chen Sheng-hsiung
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Chang Ting-chang
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Tsai Ming-hsing
Department Of Electronics Engineering National Chiao Tung University And National Nano Device Labora
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Fan Ching-Lin
Institute of Electro-Optical and Material Science, National Huwei Institute of Technology, Yunlin, Taiwan, R.O.C.
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Wu Zhen-Cheng
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan
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Wu You-Kuo
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Wu Wei-Hao
Department of Electronics Engineering, National Chiao Tung University, 1001, Ta-Hsueh Road, Hsin-Chu 300, Taiwan, R.O.C.
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Chen Mao-Chieh
Department of Electronics Engineering, National Chiao Tung University, 1001, Ta-Hsueh Road, Hsin-Chu 300, Taiwan, R.O.C.
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Chen Mao-Chieh
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan
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Chang Chun-Li
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University, 1001 Ta-Hsueh Road, Hsinchu 300, Taiwan
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Ko Chung-Chi
Taiwan Semiconductor Manufacturing Company, No. 9, Creation Rd. I, Science-Based Industrial Park HsinChu, Taiwan
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Chan Kuang-Yang
Department of Electronics Engineering, National Chiao Tung University and National Nano Device Laboratory,
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Tsui Bing-Yue
Department of Electronics Engineering, National Chiao Tung University, 1001, Ta-Hsueh Road, Hsin-Chu 300, Taiwan, R.O.C.
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Liang Mong-Song
Taiwan Semiconductor Manufacturing Company, No. 9, Creation Rd. I, Science-Based Industrial Park HsinChu, Taiwan
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Liang Mong-Song
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Road VI, Science-Based Industrial Park, Hsin-Chu 300, Taiwan, R.O.C.
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Yao Liang-Gi
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Road VI, Science-Based Industrial Park, Hsin-Chu 300, Taiwan, R.O.C.
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Yu Chen-Hua
Taiwan Semiconductor Manufacturing Company, No. 9, Creation Rd. I, Science-Based Industrial Park HsinChu, Taiwan
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Chen Hsi-Ping
Taiwan Semiconductor Manufacturing Company, No. 9, Creation Rd. I, Science-Based Industrial Park HsinChu, Taiwan
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Hou Yong-Tian
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Road VI, Science-Based Industrial Park, Hsin-Chu 300, Taiwan, R.O.C.
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Liang Mong-Song
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park, Hsinchu 300, Taiwan, R.O.C.
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Ko Chung-Chi
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan
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Li Lain-Jong
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park, Hsinchu 300, Taiwan
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Yeh Wen-Kuan
Department of Electronics Engineering, National Chiao Tung University and National Nano Device Laboratory,
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Fan Ching-Lin
Department of Electronic Engineering and Institute of Electronics, National Taiwan University of Science and Technology, 43 Sec. 4, Keelung Road, Taipei 106, Taiwan, R.O.C.
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Chen Shih-Chang
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Road VI, Science-Based Industrial Park, Hsin-Chu 300, Taiwan, R.O.C.
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Lin Hsin-Hung
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Tao Hun-Jan
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Road VI, Science-Based Industrial Park, Hsin-Chu 300, Taiwan, R.O.C.
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Wang Chao-Chun
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Liang Mong-Song
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park, Hsinchu 300, Taiwan
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Liang Mong-Song
Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park Hsinchu, Taiwan
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Chang Ting-Chang
Department of Electronics Engineering, National Chiao Tung University and National Nano Device Laboratory,
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Wu Zhen-Cheng
Department of Electronics Engineering, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
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Chen Mao-Chieh
Department of Electronics Engineering, National Chiao-Tung University, Hsinchu, Taiwan, R.O.C.
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Chen Mao-Chieh
Department of Electronics Engineering, National Chiao Tung University and National Nano Device Laboratory,
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Chen Mao-Chieh
Department of Electronics Engineering, National Chiao Tung University, Hsinchu 300, Taiwan, R.O.C.
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Jang Syun-Ming
Department of Dielectric and CMP, Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park, Hsinchu 300, Taiwan
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Jang Syun-Ming
Taiwan Semiconductor Manufacturing Company, No. 9, Creation Rd. I, Science-Based Industrial Park HsinChu, Taiwan
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Tsai Ming-Hsing
Department of Electronics Engineering, National Chiao Tung University and National Nano Device Laboratory,
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Lin Mou-Shiung
Taiwan Semiconductor Manufacture Company, Hsinchu, Taiwan, R.O.C.
著作論文
- Formation of Bilayer Shallow MoSi_2/CoSi_2 Salicide Contact Using W/Co-Mo Alloy Metallization
- Threshold Voltage Instability in nMOSFETs with HfSiO/SiO_2 High-k Gate Stacks
- Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition α-SiC : N : H Films
- Effects of O_2- and N_2-Plasma Treatments on Copper Surface
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC : H Films from Trimethylsilane and Tetramethylsilane
- Annealing Effect on Boron High-Energy-Ion-Implantation-Induced Defects in Si
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiCN:H Films with Different Hydrogen Contents
- Post-Implantation Thermal Annealing Effect on the Gate Oxide of Triple-Well-Structure
- An Efficient Improvement for Barrier Effect of W-filled Contact
- An Efficient Improvement for Barrier Effect of W-Filled Contact
- Reactively Sputtered Amorphous TaSi_xN_y Films Serving as Barrier Layer Against Copper Diffusion
- Chemically Vapor Deposited Cu Films on Ar-Plasma-Treated TiN Substrate(Surfaces, Interfaces, and Films)
- Effects of N_2O Plasma Treatment on the Performance of Excimer-Laser-Annealed Polycrystalline Silicon Thin Film Transistors
- Copper Chemical Vapor Deposition Films Deposited from Cu(1, 1, 1, 5, 5, 5-hexafluoroacetylacetonate) vinyltrimethylsilane
- Low-Temperature-Processed Polycrystalline silicon thin-film transistors Using a New Two-Step Crystallization Technique
- Annealing Effect on Boron High-Energy-Ion-Implantation-Induced Defects in Si
- Effects of Base Oxide Thickness and Silicon Composition on Charge Trapping in HfSiO/SiO2 High-$k$ Gate Stacks
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited $\alpha$-SiC:H Films from Trimethylsilane and Tetramethylsilane
- Effect of TiN Substrate Plasma Treatment on Copper Chemical Vapor Deposition
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited $\alpha$-SiCN:H Films with Different Hydrogen Contents
- Thermal Stability of Cu/NiSi-Contacted p+n Shallow Junction
- An Efficient Improvement for Barrier Effect of W-filled Contact
- Effects of O2- and N2-Plasma Treatments on Copper Surface
- Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition $\alpha$-SiC:N:H Films
- Formation of NiSi-Silicided p+n Shallow Junctions by BF2+ Implantation into/through Silicide and Rapid Thermal Annealing
- Formation and Characterization of NiSi-Silicided n+p Shallow Junctions