A Comparison of Behaviors between Hydrogenated/Unhydrogenated Polysilicon Thin Film Transistors under Electric Stress
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-07-15
著者
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FANG Yean-Kuen
VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, Nat
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LEE Kuei-Yi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Fang Y‐k
National Cheng Kung Univ. Taina Twn
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Fang Yean-kuen
Vlsi Technology Laboratory Electrical Engineering National Cheng Kung University
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Fang Yean-kuen
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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Fang Yean-kuen
Vlsi Technology Lab. Institute Of Microelectronics Ee Department National Cheng Kung University No.
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Huang K‐c
National Chiao Tung Univ. Hsinchu Twn
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LIANG Mong-Song
Taiwan Semiconductor Manufacturing Co., Ltd.
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Liang Mong-song
R&d Department Taiwan Semiconductor Manufacturing Company
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Liang Mong-song
Taiwan Semiconductor Manufacturing Co. Ltd.
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Huang Kuo-ching
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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Lee K‐y
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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Lee Ki-young
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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YAUNG Dun-Nian
VLSI Technology Laboratory, Department of Electrical Engineering, National Cheng Kuang University
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LEE Kan-Yuan
VLSI Technology Laboratory, Department of Electrical Engineering, National Cheng Kuang University
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HWANG Kuo-Ching
VLSI Technology Laboratory, Department of Electrical Engineering, National Cheng Kuang University
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WUU Shou-Gwo
Taiwan Semiconductor Manufacturing Company
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Lin M‐s
Taiwan Semiconductor Manufacturing Company
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Yaung Dun-nian
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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