Application of In-Situ Al-Flow Process for Triple-level Metallization
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-03-15
著者
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LEE Kuei-Yi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Lee K‐y
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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Lee Ki-young
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kuang University
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LEE Ki-Young
Logic PA Team, Semiconductor Business, Samsung Electronics Co., Ltd.
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LEE Su-Cheon
Logic PA Team, Semiconductor Business, Samsung Electronics Co., Ltd.
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KIM Young-Wug
Logic PA Team, Semiconductor Business, Samsung Electronics Co., Ltd.
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Kim Y‐w
Hanyang Univ.‐ansan Kyunggi‐do Kor
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Kim Young-wug
Logic Pa Team Semiconductor Business Samsung Electronics Co. Ltd.
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Lee Su-cheon
Logic Pa Team Semiconductor Business Samsung Electronics Co. Ltd.
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- Application of In-Situ Al-Flow Process for Triple-level Metallization