The Growth and Characterization of Silicon/Silicon Carbide Heteroepitaxial Films on Silicon Substrates by Rapid Thermal Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-07-15
著者
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FANG Yean-Kuen
VLSI Technology Laboratory, Institute of Microelectronics, Department of Electrical Engineering, Nat
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Fang Yean-kuen
Vlsi Technology Lab. Institute Of Microelectronics Ee Department National Cheng Kung University No.
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Wu Kwo-hau
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University
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Wu Kaung-hsiung
Department Of Electrophysics National Chiao Tung University
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Wu K‐h
National Chiao‐tung Univ. Hsinchu Twn
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WU Kuen-Hsien
VLSI Technology Laboratory, Department of Electrical Engineering, National Cheng Kung University
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FANG Jen-Yeu
VLSI Technology Laboratory, Department of Electrical Engineering, National Cheng Kung University
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HWANG Jun-Dar
VLSI Technology Laboratory, Department of Electrical Engineering, National Cheng Kung University
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Wu Kuen-hsien
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kung University
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Hwang Jun-dar
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kung University
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Fang Jen-yeu
Vlsi Technology Laboratory Department Of Electrical Engineering National Cheng Kung University
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