Thermally Activated Diffusion Observed by In situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO_3 Homoepitaxial Growth

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概要

• 論文の詳細を見る
• 2004-02-15

著者

• Uen Tseng-ming

  Department Of Electrophysics National Chiao Tung University

• Wu Kaung-hsiung

  Department Of Electrophysics National Chiao Tung University

• JUANG Jenh-Yih

  Department of Electrophysics, National Chiao Tung University

• Gou Yih-shun

  Department Of Electrophysics National Chiao-tung University

• Uen T‐m

  Department Of Electrophysics National Chiao-tung University

• Uen Tzeng-ming

  Department Of Electrophysics National Chiao-tung University

• WANG Te-Chun

  Department of Electrophysics, National Chiao-Tung University

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• Thermally Activated Diffusion Observed by In situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO_3 Homoepitaxial Growth
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• Thermally Activated Diffusion Observed by In situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO3 Homoepitaxial Growth
• Activated Kinetics of Room-Temperature-Deposited SrTiO3 Thin Films Investigated by Reflection-High-Energy-Electron-Diffraction-Monitored Annealing at Different Heating Rates

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