Thermally Activated Diffusion Observed by In situ Reflection High Energy Electron Diffraction Intensity Monitoring on Interrupted SrTiO3 Homoepitaxial Growth
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概要
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The reflection high energy electron diffraction (RHEED) intensity is reported following a quadratic power law dependence on annealing time for interrupted laser ablation-grown strontium titanate films. The activation energy of 1.0 eV can further be obtained from the diffusion Arrhenius plot by assuming a direct proportionality between the RHEED intensity and the diffusion length.
- 2004-02-15
著者
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Gou Yih-shun
Department Of Electrophysics National Chiao-tung University
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Juang Jenh-yih
Department Of Elctrophysics National Chiao Tung University
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Wang Te-chun
Department Of Electrophysics National Chiao-tung University
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Uen Tzeng-ming
Department Of Electrophysics National Chiao Tung University
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Wu Kaung-hsiung
Department Of Elctrophysics National Chiao Tung University
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Gou Yih-Shun
Department of Electrophysics, National Chiao-Tung University, Hsinchu 300, Taiwan, ROC
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Uen Tzeng-Ming
Department of Electrophysics, National Chiao-Tung University, Hsinchu 300, Taiwan, ROC
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Wang Te-Chun
Department of Electrophysics, National Chiao-Tung University, Hsinchu 300, Taiwan, ROC
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Juang Jenh-Yih
Department of Electrophysics, National Chiao-Tung University, Hsinchu 300, Taiwan, ROC
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Wu Kaung-Hsiung
Department of Electrophysics, National Chiao-Tung University, Hsinchu 300, Taiwan, ROC
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