Permittivity Enhancement of Hf_<(1-x)>Si_xO_2 Film with High Temperature Annealing

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概要

• 論文の詳細を見る
• 2005-09-13

著者

• KITA Koji

  Department of Materials Science, Graduate School of Engineering, The University of Tokyo

• TORIUMI Akira

  Department of Materials Science, Graduate School of Engineering, The University of Tokyo

• Kita Koji

  Department Of Materials Engineering School Of Engineering The University Of Tokyo

• Toriumi Akira

  Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial

• Toriumi A

  Univ. Tokyo Tokyo Jpn

• Toriumi Akira

  The Authors Are With Advanced Lsi Technology Laboratory Toshiba Corporation:presently With The Depar

• Toriumi Akira

  Advanced Lsi Technology Toshiba Corporation

• Toriumi Akira

  Department Of Applied Physics University Of Tokyo

• TOMIDA Kazuyuki

  Research Fellow of the Japan Society for the Promotion of Science

• TOMIDA Kazuyuki

  Department of Materials Engineering, School of Engineering, The University of Tokyo

• Toriumi Akira

  Department Of Materials Engineering The University Of Tokyo

• Kita Koji

  Department Of Materials Engineering The University Of Tokyo

• Toriumi Akira

  Mirai-asrc Aist

• Kita Koji

  Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan

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