Suppression of Leakage Current and Moisture Absorption of La2O3 Films with Ultraviolet Ozone Post Treatment
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概要
- 論文の詳細を見る
In this study, ultraviolet (UV) ozone post treatment is proposed as an effective method of suppressing gate leakage current associated with the moisture absorption of lanthanum oxide (La2O3) films. It is considered that suppression effects come from the healing of oxygen vacancies in the film by the UV ozone post treatment, since the oxygen ambient annealing also shows similar suppression effects. As compared with the oxygen ambient annealing, however, the UV ozone treatment does not enhance the interface layer thickness between the La2O3 and Si substrates, whereas the oxygen ambient annealing does. Therefore, the UV ozone post treatment is an effective method of suppressing the moisture absorption of La2O3 films.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-07-15
著者
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Kita Koji
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Toriumi Akira
Department Of Applied Physics University Of Tokyo
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Zhao Yi
Department Of Chemistry Tongji University
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Kita Koji
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Toriumi Akira
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Kyuno Kentaro
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Kyuno Kentaro
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Zhao Yi
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Kita Koji
Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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