Observation of the Creation and Annihilation of Local Current Paths in HfO2 Thin Films on Pt by Ultrahigh-Vacuum Conductive Atomic Force Microscopy: Evidence of Oxygen Spill Over during the Forming Process
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概要
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By direct observation using ultrahigh-vacuum conductive atomic force microscopy, we find the reversible creation and annihilation of individual local current paths in HfO2 thin films on Pt. Experimental evidence of oxygen ion diffusion due to an electric field is obtained.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-06-25
著者
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Kita Koji
Department Of Materials Engineering School Of Engineering The University Of Tokyo
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Toriumi Akira
Department Of Applied Physics University Of Tokyo
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Kita Koji
Department of Materials Science, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Kyuno Kentaro
Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Kyuno Kentaro
Department of Materials Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
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Sasaki Naotaka
Department of Materials Science, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Kita Koji
Department of Material Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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