SPV(Surface Photo-voltage)スペクトロスコピーによる超精密加工表面評価法の開発

概要

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To develop nondestructive estimation technique for surface electronic structures of ultraprecisely prepared surfaces is very important and strongly required. SPV (Surface Photo-voltage) effect which can be observed non-destructively has been focused as an interesting phenomenon having possibilities to be sensitive to the properties of the processed surfaces. In this work, new detection system of surface photo-voltage signal with extremely high sensitivity has been developed. Si surfaces finely-prepared by ultraprecision machining processes are observed. As the results, sufficiently high sensitivities are established and some new facts are obtained such as differences of surface state densities between chemical etched surfaces employing different etchants. And the electronic state density in the midgap state of the EEM surface is the smallest in those of observed surfaces in this work and its distribution is shifting to the shallow side of the forbidden band.
社団法人精密工学会の論文
2000-04-05