Strain-Relaxed Si_<1-x>Ge_x and Strained Si Grown by Sputter Epitaxy

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概要

• 論文の詳細を見る
• 2007-09-19

著者

• Suda Yoshiyuki

  Tokyo Univ. Agriculture And Technol. Tokyo Jpn

• MATSUI Toshiaki

  National Institute of Info. & Com. Tech.

• Matsui Toshiaki

  Communications Research Laboratory Ministry Of Posts And Telecommunications

• Mimura Takashi

  National Institute Of Information And Communications Technology (nict)

• Matsui Toshiaki

  National Institute Of Information And Communications Technology (nict)

• Hirose Nobumitsu

  National Inst. Of Information And Communications Technology

• Hanafusa Hiroaki

  Graduate School Of Engineering Tokyo University Of Agriculture And Technology

• Suda Yoshiyuki

  Graduate School Of Engineering Hokkaido University

• KASAMATSU Akifumi

  National Inst. of Information and Communications Technology

• MIMURA Takashi

  National Institute of Information and Communications Technology

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