Effects of Oxygen and Substrate Temperature on Properties of Amorphous Carbon Films Fabricated by Plasma-Assisted Pulsed Laser Deposition Method
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概要
- 論文の詳細を見る
- 2002-07-15
著者
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Suzuki Kaoru
Departments of Electrical Engineering, College of Science and Technology, Nihon University
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Suda Yoshiyuki
Graduate School Of Engineering Tokyo University Of Agriculture And Technology
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Sakai Yosuke
Graduate School Of Engineering Hokkaido University
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Suzuki Kaoru
Department Of Internal Medicine Niigata Prefectural Shibata Hospital
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Ono Tomoyuki
Graduate School Of Engineering Hokkaido University
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Suda Y
Graduate School Of Engineering Hokkaido University
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AKAZAWA Masamichi
Graduate School of Engineering, Hokkaido University
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赤澤 正道
北海道大学量子集積エレクトロニクス研究センター
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Suda Yoshiyuki
Graduate School Of Engineering Hokkaido University
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Akazawa M
Hokkaido Univ. Sapporo Jpn
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Akazawa Masamichi
Graduate School Of Engineering Hokkaido University
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Akazawa Masamichi
Department Of Electrical Engineering Faculty Of Engineering And Research Center For Interface Quantu
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Akazawa Masamichi
Department Of Electrical Engineering Hokkaido University
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Akazawa Masamichi
Research Center For Interface Quantum Electronics And Department Of Electrical Engineering Hokkaido
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Suzuki Kaoru
Department Of Basic Human Sciences School Of Human Sciences Waseda University
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Suzuki Kaoru
Department Of Electrical Engineering College Of Science And Technology. Nihon University
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Suzuki Kaoru
Department Of Applied Chemistry Faculty Of Science Science University Of Tokyo
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赤澤 正道
北海道大学情報科学研究科量子集積エレクトロニクス研究センター
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