Removal of Diamond-Like Carbon Film by Oxygen-Dominated Plasma Beam Converted from Filtered Carbon-Cathodic Arc
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概要
- 論文の詳細を見る
Diamond-like carbon (DLC) film is sometimes removed using oxygen plasma in order to reuse workpieces such as cutting tools and press molds. In this study, an oxygen-dominated plasma beam was generated by converting the cathodic carbon arc plasma beam formed in T-shaped filtered-arc-deposition (T-FAD) in order to investigate the feasibility of using the plasma beam for the removal of DLC film. When the oxygen (O2) gas flow rate was relatively high (50 ml/min) and the substrate was biased (DC $-500$ V), the plasma beam in front of the substrate was confirmed to contain a considerable amount of excited oxygen atoms, since an atomic oxygen spectral line (777 nm) emitted from the plasma beam had relatively strong radiation intensity. The plasma beam was irradiated on a tetrahedral amorphous carbon film, a hydrogen-free sp3-rich DLC film, prepared on a hard alloy (WC with 6 wt % Co binder) substrate. It was found that a plasma beam generated with an appropriate O2 gas flow rate and applied substrate bias was able to etch the DLC film proportionally to the treatment time. The surface was not roughened when the treatment time was 1.5 times longer than the intended time to remove a given thickness of DLC film.
- 2011-01-25
著者
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須田 善行
北海道大学
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Takikawa Hirofumi
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
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Kamiya Masao
Department Of Animal Disease Control Graduate School Of Veterinary Medicine Hokkaido University
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Suda Y
Graduate School Of Engineering Hokkaido University
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Tanoue Hideto
Department of Electric and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8105, Japan
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Tanoue Hideto
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan
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Suda Yoshiyuki
Department of Electric and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan
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Oke Shinichiro
Tsuyama National College of Technology, Tsuyama, Okayama 708-8509, Japan
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Ishikawa Takeshi
Hitachi Tool Engineering, Ltd., Matsue 690-0816, Japan
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Suda Yoshiyuki
Graduate School of Information Science and Technology, Hokkaido University, North 14, West 9, Sapporo 060-0814, Japan
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Tsuji Nobuhiro
Onward Ceramic Coating Co., Ltd., Nomi, Ishikawa 929-0111, Japan
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Kamiya Masao
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan
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Hasegawa Yushi
Onward Ceramic Coating Co., Ltd., Nomi, Ishikawa 929-0111, Japan
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Taki Makoto
Onward Ceramic Coating Co., Ltd., Nomi, Ishikawa 929-0111, Japan
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Yasui Haruyuki
Industrial Research Institute of Ishikawa, Kanazawa 929-8203, Japan
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Takikawa Hirofumi
Department of Electric and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8105, Japan
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