Fluorinated Carbon Films with Low Dielectric Constant Made from Novel Fluorocarbon Source Materials by RF Plasma Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-12-15
著者
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Lungu Ana
Graduate School Of Engineering Hokkaido University:national Institute Of Lasers Plasma And Radiation
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Lungu Cristian
Graduate School Of Engineering Hokkaido University:national Institute Of Lasers Plasma And Radiation
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Sakai Yosuke
Graduate School Of Engineering Hokkaido University
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Sugawara Hirotake
Graduate School Of Engineering Hokkaido University
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Sugawara Hirotake
Division Of Electronics For Informatics Graduate School Of Information Science And Technology Hokkai
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AKAZAWA Masamichi
Graduate School of Engineering, Hokkaido University
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TABATA Masayoshi
Graduate School of Engineering, Hokkaido University
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Tabata Masayoshi
Graduate School Of Engineering Hokkaido University
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Akazawa Masamichi
Graduate School Of Engineering Hokkaido University
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Akazawa Masamichi
Department Of Electrical Engineering Faculty Of Engineering And Research Center For Interface Quantu
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