Relaxation Behavior of Sputter Epitaxy Si_<1-x>Ge_x Film on P-Type Si(001) and NDR Observation from Hole-Tunneling RTD at RT
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Kubota Junichi
Graduate School Of Engineering Tokyo University Of Agriculture And Technology
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Suda Yoshiyuki
Graduate School Of Engineering Hokkaido University
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HASHIMOTO Atsushi
Graduate School of Engineering, Tokyo University of Agriculture and Technology
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Hashimoto Atsushi
Graduate School Of Engineering Tokyo University Of Agriculture And Technology
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