MIMURA Takashi | National Institute of Information and Communications Technology
スポンサーリンク
概要
関連著者
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MATSUI Toshiaki
National Institute of Info. & Com. Tech.
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MIMURA Takashi
National Institute of Information and Communications Technology
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Hirose Nobumitsu
National Inst. Of Information And Communications Technology
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Matsui Toshiaki
Communications Research Laboratory Ministry Of Posts And Telecommunications
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Mimura Takashi
National Institute Of Information And Communications Technology (nict)
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Hanafusa Hiroaki
Graduate School Of Engineering Tokyo University Of Agriculture And Technology
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Suda Yoshiyuki
Graduate School Of Engineering Hokkaido University
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HIGASHIWAKI Masataka
National Institute of Information and Communications Technology
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KASAMATSU Akifumi
National Inst. of Information and Communications Technology
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Endoh Akira
National Inst. Of Information And Communications Technol. (nict) Koganei‐shi Jpn
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WATANABE Issei
National Institute of Info. & Com. Tech.
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Matsui Toshiaki
National Institute Of Information And Communications Technology (nict)
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Higashiwaki M
National Institute Of Information And Communications Technology
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Chong Harold
School of Electronic and Computer Science, University of Southampton, Highfield, Southampton SO17 1BJ, U.K.
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Mizuta Hiroshi
School of Electronic and Computer Science, University of Southampton, Highfield, Southampton SO17 1BJ, U.K.
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Mimura Takashi
National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan
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Higashiwaki Masataka
National Institute of Information and Communications Technology, 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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ONOJIMA Norio
National Institute of Information and Communications Technology (NICT)
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Endoh A
Fujitsu Lab. Ltd. Atsugi Jpn
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Suda Yoshiyuki
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Yamashita Yoshimi
Fujitsu Laboratories Ltd.
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SHINOHARA Keisuke
National Institute of Info. & Com. Tech.
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KITADA Takahiro
Osaka University
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SHIMOMURA Satoshi
Osaka University
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HIYAMIZU Satoshi
Osaka University
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Watanabe Issei
National Institute Of Information And Communications Technology (nict)
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Mimura T
National Institute Of Information And Communications Technology
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Matsui Toshiaki
National Institute of Information and Communications Technology, 4-2-1 Nukui-kitamachi, Koganei, Tokyo 184-8795, Japan
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Matsui Toshiaki
National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan
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Mimura Takashi
National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Mimura Takashi
National Institute of Information and Communications Technology (NICT), Koganei, Tokyo 184-8795, Japan
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Mimura Takashi
National Institute of Information and Communications Technology, 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Onojima Norio
National Institute of Information and Communications Technology (NICT), Koganei, Tokyo 184-8795, Japan
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Endoh Akira
National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan
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Endoh Akira
National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Shimomura Satoshi
Osaka University, 3-1 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Shinohara Keisuke
National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Watanabe Issei
National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Watanabe Issei
National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan
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Hirose Nobumitsu
National Institute of Information and Communications Technology, 4-2-1 Nukui-kitamachi, Koganei, Tokyo 184-8795, Japan
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Hirose Nobumitsu
National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan
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Hiyamizu Satoshi
Osaka University, 3-1 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Kitada Takahiro
Osaka University, 3-1 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
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Kasamatsu Akifumi
National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan
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Kasamatsu Akifumi
National Institute of Information and Communications Technology, 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Hanafusa Hiroaki
Graduate School of Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
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Hanafusa Hiroaki
Graduate School of Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
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Matsui Toshiaki
National Institute of Information and Communications Technology (NICT), 4-2-1 Nukui-Kitamachi, Koganei, Tokyo 184-8795, Japan
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Matsui Toshiaki
National Institute of Information and Communications Technology (NICT), Koganei, Tokyo 184-8795, Japan
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Yamashita Yoshimi
Fujitsu Laboratories Limited, 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Suda Yoshiyuki
Graduate School of Engineering, Tokyo University of Agriculture and Technology, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan
著作論文
- Strain Distribution Analysis of Sputter-Formed Strained Si by Tip-Enhanced Raman Spectroscopy
- Si/Ge Hole-Tunneling Double-Barrier Resonant Tunneling Diodes Formed on Sputtered Flat Ge Layers
- E-Band Low-Noise Amplifier MMICs Using Nanogate InGaAs/InAlAs HEMT Technology
- Development of High-Frequency GaN HFETs for Millimeter-Wave Applications
- AlGaN/GaN Heterostructure Field-Effect Transistors on 4H-SiC Substrates with Current-Gain Cutoff Frequency of 190 GHz
- Strain-Relaxed Si_Ge_x and Strained Si Grown by Sputter Epitaxy
- 30-nm-Gate AlGaN/GaN Heterostructure Field-Effect Transistors with a Current-Gain Cutoff Frequency of 181 GHz
- Ge Flat Layer Growth on Heavily Phosphorus-Doped Si(001) by Sputter Epitaxy
- Effect of Gate-Recess Structure on Electron Transport in InP-Based High Electron Mobility Transistors Studied by Monte Carlo Simulations
- High Off-state Breakdown Voltage 60-nm-Long-Gate AlGaN/GaN Heterostructure Field-Effect Transistors with AlGaN Back-Barrier
- Effects of Heterointerface Flatness on Device Performance of InP-Based High Electron Mobility Transistor
- High-Performance Short-Gate InAlN/GaN Heterostructure Field-Effect Transistors
- Strain-Relaxed Si1-xGex and Strained Si Grown by Sputter Epitaxy
- Erratum: "High-Performance Short-Gate InAlN/GaN Heterostructure Field-Effect Transistors"
- Effects of Si Deposition on AlGaN Barrier Surfaces in GaN Heterostructure Field-Effect Transistors