Determination of Lateral Extension of Extrinsic Photon Recycling in p-GaN by Using Transmission-Line-Model Patterns Formed with GaN p--n Junction Epitaxial Layers
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概要
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The effect of extrinsic photon recycling (EPR) in p-type gallium nitride (p-GaN), namely, increased ionization ratio (R) of magnesium acceptors owing to radiative recombination, was quantitatively investigated. The lateral extension (L) of EPR was determined by using transmission-line-model (TLM) patterns, formed with GaN p--n junction epitaxial layers on free-standing substrates, as well as by using device simulation. With increasing vertical current (I_{\text{V}}) of the p--n junction, lateral current (I_{\text{L}}) in the p-GaN layer (magnesium concentration: N_{\text{Mg}} = 5\times 10^{17} cm<sup>-3</sup>) was found to increase within L of 10 μm from the edge of the TLM electrodes; the measured I_{\text{L}} corresponded to a large R, namely, 30%. This lateral extension will contribute to reducing base resistance and enhancing conductivity modulation of GaN bipolar power-switching devices for power-electronics applications.
- 2013-08-25
著者
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Tanaka Shigehisa
Central Research Laboratory Hitachi Limited
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Tsuchiya Tomonobu
Central Research Laboratory Hitachi Ltd
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Uchiyama Hiroyuki
Central Research Lab. Hitachi Ltd.
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Nakamura Tohru
Department Of Applied Chemistry And Chemical Engineering Faculty Of Engineering Kagoshima University
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Terano Akihisa
Central Research Laboratory Hitachi Ltd.
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Ishida Yuya
Department Of Dermatology Kyoto University Graduate School Of Medicine
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Mochizuki Kazuhiro
Central Research Lab.hitachi Ltd.
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Mishima Tomoyoshi
Research & Development Laboratory, Corporate Advanced Technology Group, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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Kaneda Naoki
Research & Development Laboratory, Corporate Advanced Technology Group, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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Nomoto Kazuki
Research Center for Micro--Nano Technology, Hosei University, Koganei, Tokyo 184-0003, Japan
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Uchiyama Hiroyuki
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
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Mishima Tomoyoshi
Research and Development Laboratory, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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Nakamura Tohru
Department of Electronics, Electrical and Computer Engineering, Hosei University, Koganei, Tokyo 184-8584, Japan
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Hatakeyama Yoshitomo
Department of Electronics, Electrical and Computer Engineering, Hosei University, Koganei, Tokyo 184-8584, Japan
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Tshuchiya Tadayoshi
Research and Development Laboratory, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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Kaneda Naoki
Research and Development Laboratory, Hitachi Cable, Ltd., Tsuchiura, Ibaraki 300-0026, Japan
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