Highly Selective Wet-Etching Using Adipic Acid for Uniform Damage-Free Process of InAlAs/InGaAs HEMTs
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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KUDO Makoto
Central Research Laboratory, Hitachi, Ltd.
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Kudo M
Hitachi Ltd. Tokyo Jpn
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HIGUCHI Katsuhiko
Central Research Laboratory, Hitachi, Ltd.
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HIGUCHI Koichi
Department of Applied Chemistry, Faculty of Engineering, Gunma University
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Kudo M
Seikei Univ. Tokyo Jpn
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Kudo Makoto
Central Research Lab. Hitachi Ltd.
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MISHIMA Tomoyoshi
Central Research Laboratory, Hitachi, Ltd.
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UCHIYAMA Hiroyuki
Central Research Lab., Hitachi, Ltd.
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SHIOTA Takashi
Central Research Lab., Hitachi, Ltd.
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Uchiyama Hiroyuki
Central Research Lab. Hitachi Ltd.
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Uchiyama Hiroyuki
Central Research Laboratory Hitachi Ltd.
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Uchiyama H
International Superconductivity Technol. Center Tokyo Jpn
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Kudo Masahiro
Institute Of Industrial Science University Of Tokyo
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Shiota Takashi
Central Research Lab. Hitachi Ltd.
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Higuchi K
Department Of Applied Chemistry Faculty Of Engineering Gunma University
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Higuchi Katsuhiko
Central Research Lab. Hitachi Ltd.
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Mishima T
Central Research Laboratory Hitachi Ltd.
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Mishima Tomoyoshi
Central Research Lab. Hitachi Ltd.
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