Gas-Source Molecular Beam Epitaxy Growth of Metamorphic InP/In_<0.5>Al_<0.5>As/In_<0.5>Ga_<0.5>As/InAsP High-Electron-Mobility Structures on GaAs Substrates
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-02-28
著者
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KUDO Makoto
Central Research Laboratory, Hitachi, Ltd.
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Kudo Makoto
Central Research Lab. Hitachi Ltd.
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Kudo Makoto
Central Research Laboratory Hitachi Ltd.
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OUCHI Kiyoshi
Central Research Laboratory, Hitachi, Ltd.
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MISHIMA Tomoyoshi
Central Research Laboratory, Hitachi, Ltd.
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OHTA Hiroshi
Process Engineering Development Dept., Hitachi ULSI Systems Co., Ltd.
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Kudo M
Central Research Laboratory Hitachi Ltd.
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Ouchi Kiyoshi
Central Research Laboratory Hitachi Ltd.
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Mishima T
Central Research Laboratory Hitachi Ltd.
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Mishima Tomoyoshi
Central Research Lab. Hitachi Ltd.
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Ohta Hiroshi
Process Engineering Development Dept. Hitachi Ulsi Systems Co. Ltd.
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- Transition of Infrared Absorption Peaks in Thermally Annealed GaInNAS : Optics and Quantum Electronics : Optical Properties of Condensed Matter
- Low-Lattice-Strain Long-Wavelength GaAsSb/GaInAs Type-II Quantum Wells Grown on GaAs Substrates
- Gas-Source Molecular Beam Epitaxy Growth of Metamorphic InP/In_Al_As/In_Ga_As/InAsP High-Electron-Mobility Structures on GaAs Substrates
- Dry Etching Damage and Activation Ratio Degradation in δ-Doped AlGaAs/InGaAs High Electron Mobility Transistors
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- Morphological Evolution of the InGaN-Based Quantum Well Surface due to a Reduced Density of Threading Dislocations in the Underlying GaN through Higher Growth Pressure
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