Translational Temperature Measurement for SiH2 in RF Silane Plasma Using CW Laser Induced Fluorescence Spectroscopy
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概要
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Laser-induced fluorescence spectroscopy using a cw ring dye laser was applied to the detection of low-density SiH2 in a low-power RF SiH4/Ar mixture plasma at 40 mTorr. The translational temperature of SiH2 in the plasma was determined from the excitation line profile and was found to be near room temperature irrespective of the SiH4 mixing ratio.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1998-08-15
著者
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HIROSE Satoshi
Department of Chemistry and Biochemistry, Graduate School of Engineering, Kyushu University
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Kono Akihiro
Center For Cooperative Research In Advanced Science And Technology Nagoya University
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Kinoshita Keizo
Association Of Super-advanced Electronics Technologies Yokohama Research Center
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GOTO Toshio
Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University
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Hirose Satoshi
Department of Quantum Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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