Laser-Induced-Fluorescence Detection of SiH_2 Radicals in a Radio-Frequency Silane Plasma

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概要

• 論文の詳細を見る

• Silylene radicals (SiH_2) in a 40-W 40-mTorr RF (13.56 MHz) SiH_4/Ar plasma were detected by use of a laser-induced-fluorescence (LIF) technique. The observed SiH_2 density increased with increasing Ar partial pressure. The absolute SiH_2 density, estimated from the comparison of the LIF intensity with the intensity of Rayleigh scattering caused by N_2 molecules, is in the range of 10^9-10^<10> cm^<-3>.

• 社団法人応用物理学会の論文
• 1993-04-01

著者

• Koike N

  Nagoya Univ. Nagoya Jpn

• Kono Akihiro

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• Kono A

  Nagoya Univ. Nagoya Jpn

• Kono Akihiro

  Department Of Electrical Engineering And Computer Science Nagoya University

• Goto Toshio

  Department Of Electronics Faculty Of Engineering Nagoya University

• KOIKE Naoki

  Department of Information Electronics, School of Engineering, Nagoya University

• OKUDA Kenichi

  Department of Information Electronics, Nagoya University

• Okuda Kenichi

  Department Of Information Electronics Nagoya University

• Goto Toshio

  Department Of Electronic Mechanical Engineering Nagoya University

• GOTO Toshio

  Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University

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