Level Excitation Cross Sections of Atomic Fragments in Low-Energy Electron Impact Dissociation of Group IV Hydrides

スポンサーリンク

概要

• 論文の詳細を見る

• The decay curves of atomic emissions observed in the low-energy electron impact excitation of GeH_4, SiH_4, and CH_4 molecules were measured to evaluate the contributions of cascade transitions to the line emissions. By separating the cascade contributions from the fragment emission cross sections, level excitation cross sections were determined for the Ge I 5s ^1P^o, Si I 4s ^1P^o, and C I 3s ^1P^o levels. The measurements were carried out at the electron energies of 100 eV and around 30 eV. In every case, it was found that about half of these emissive fragments were produced by the radiative cascade from higher levels.

• 社団法人応用物理学会の論文
• 1990-01-20

著者

• Tint Kyaw

  Department Of Electronics School Of Engineering Nagoya University

• Kono Akihiro

  Center for Cooperative Research in Advanced Science and Technology, Nagoya University

• Kono A

  Nagoya Univ. Nagoya Jpn

• Kono Akihiro

  Department Of Electrical Engineering And Computer Science Nagoya University

• Goto Toshio

  Department Of Electronics Faculty Of Engineering Nagoya University

• Goto Toshio

  Department Of Electronic Mechanical Engineering Nagoya University

• Goto Toshio

  Department Of Electronics School Of Engineering Nagoya University

• GOTO Toshio

  Department of Agricultural Chemistry, Faculty of Agriculture, Nagoya University

関連論文

• Diamond Film Formation by OH Radical Injection from Remote Microwave H_2/H_2O Plasma into Parallel-Plate RF Methanol Plasma
• High-Rate Anisotropic Ablation and Deposition of Polytetrafluoroethylene Using Synchrotron Radiation Process
• Synthesis of Diamond Using RF Magnetron Methanol Plasma Chemical Vapor Deposition Assisted by Hydrogen Radical Injection
• Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
• H_2 Partial Pressure Dependences of CH_3 Radical Density and Effects of H_2 Dilution on Carbon Thin-Film Formation in RF Discharge CH_4 Plasma
• Correlation between CH_3 Radical Density and Carbon Thin-Film Formation in RF Discharge CH_4 Plasma
• Calculated Three Dimensional Spatial Distribution of CH_3 Radical Density in the RF Discharge CH_4 Plasma with Parallel-Plate Electrodes
• Effect of Rare Gas Dilution on CH_3 Radical Density in RF-Discharge CH_4 Plasma
• Improved Performance of Discharge-Pumped XeCl Laser Using Ar/He Diluent
• High Performance of Silicon Oxide Selective Etching Using F_2 Gas and Graphite Instead of Perfluorinated Compound Gases
• Diamond Deposition and Behavior of Atomic Carbon Species in a Low-Pressure Inductively Coupled Plasma
• Behaviors of carbon atom density in hydrocarbon and fluorocarbon plasmas
• Measurement of Einstein's A Coefficient of the 296.7 nm Transition Line of the Carbon Atom
• Measurement of Carbon Atom Density in High Density Plasma Process
• Electrophysiological and Biochemical Effects of Exposure to 2, 5-Hexanedione on Peripheral Nerve in Experimental Diabetic Rats
• Effects of Oxygen and Nitrogen Atoms on SiOCH Film Etching in Ultrahigh-Frequency Plasma
• Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N_2 and H_2 Gas Chemistry
• Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
• CH_3 Radical Density in Electron Cyclotron Resonance CH_3OH and CH_3OH/H_2 Plasmas
• CW Laser-Induced Fluorescence Study of SiH_2+ SiH_4 Reaction : Dominance of Two-Body Reaction Channel in Low-Pressure Silane Plasma
• Translational Temperature Measurement for SiH_2 in RF Silane Plasma Using CW Laser Induced Fluorescence Spectroscopy
• Laser-Induced-Fluorescence Study of SiH2 in a RF SiH4/SiH2Cl2 Plasma (レ-ザ-および放射光の半導体プロセス分野への応用特集号)
• Evaluation of CF_2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective SiO_2 Etching Process Using Radical Injection Technique
• CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
• Characteristics of Fluorocarbon Radicals and CHF_3 Molecule in CHF_3 Electron Cyclotron Resonance Downstream Plasma
• CF_X(X=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition ( Plasma Processing)
• Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
• Protective Effect of FR168888, a New Na^+/H^+ Exchange Inhibitor, on Ischemia and Reperfusion-Induced Arrhythmia and Myocardial Infarction in Rats : In Comparison With Other Cardioprotective Compounds
• Kinetics of CF_x (x = 1-3) Radicals and Electrons in RF CF_4-H_2, CHF_3-H_2 and CHF_3-O_2 Plasmas
• CF_3, CF_2 and CF Radical Measurements in RF CHF_3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy ( Plasma Processing)
• Squeezed Vacuum Generation Using Symmetric Nonlinear Polarization Interferometer : Optics and Quantum Electronics
• Nonlinear Polarization Interferometer for Photon-Number Squeezed Light Generation : Optics and Quantum Electronics
• Analysis of Generation Mechanism of Photon-Number Squeezed Light Using Ultrashort Pulse and Asymmetric Fiber Loop Mirror
• Characteristics of Intensity Noise Reduction of Optical Pulses Using Variabel Spectral Filters and Optical Fibers
• Measurements of the CF Radical in DC Pulsed CF_4/H_2 Discharge Plasma Using Infrared Diode Laser Absorption Spectroscopy
• Spatial Distribution of SiH_3 Radicals in RF Silane Plasma
• SiH_3 Radical Density in Pulsed Silane Plasma
• Diffusion Coefficient and Reaction Rate Constant of the SiH_3 Radical in Silane Plasma
• Measurement of the SiH_3 Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy : Techniques, Instrumentations and Measurement
• Measurement of Spatial Distribution of SiF_4 and SiF_2 Densities in High Density SiF_4 Plasma Using Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
• Spatial Distribution Measurement of Absolute Densities of CF and CF_2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique
• Effects of Dilution Gases on Si Atoms and SiHx^^+ (X = 0-3) Ions in Electron Cyclotron Resonance SiH_4 Plasmas
• Measurements of the CF, CF_2 and CF_3 Radicals in a CHF_3 Electron Cyclotron Resonance Plasma
• Stimulation of Choleresis by Insulin-Like Growth Factor-l in Rats
• Does the Exposure to 2, 5-Hexanedione Hasten the Onset of Peripheral Neuropathy in Streptozotocin-Induced Diabetic Rats?
• Analysis of Effect of Chromatic Dispersion for Wavelength Tunable Ultrashort Soliton Pulse Generation
• Measurement of Timing Jitter in Wavelength Tunable Femtosecond Soliton Pulses
• Characteristics of Wavelength Tunable Femtosecond Soliton Pulse Generation Using Femtosecond Pump Laser and Polarization Maintaining Fiber
• Timing Jitter in Amplitude Modulated Harmonically Mode-Locked Er-Doped Fiber Ring Lasers
• Effect of Group-Velocity Dispersion on Photon-Number Squeezing of Optical Pulses using Optical Fibers and Spectral Filter
• Generation and Detection of Squeezed Light with Phase Tunable Fiber Loop Mirror using Polarization Beam Splitter
• Generation of Transform-Limited Pulse Train in New Scheme of Harmonically Mode-Locked Er-Doped Fiber Ring Lasers
• Effect of Guided Acoustic Wave Brillouin Scattering on Pulsed Squeezing in Optical Fibers with Nonlinearity and Dispersion
• Amplitude Modulated Harmonic Mode-Locking Characteristics of Er^ Doped Fiber Ring Laser
• Characteristics of Guided Acoustic Wave Brillouin Scattering in Polarization Maintaining Fibers
• Squeezed Light Generation with 1.064 μm Nd:YAG Laser and 0.85 μm Single-Mode Fiber
• The Profile of FR140423, a Novel Anti-inflammatory Compound, in Yeast-Induced Rat Hyperalgesia
• Deposition of Diamond-Like Carbon Using Compact Electron-Beam-Excited Plasma Source
• Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source
• Protective Effect of FR 183998, a Na^+/H^+ Exchange Inhibitor, Against Postischemic Injury After Normothermic and Prolonged Hypothermic Ischemia in Isolated Perfused Rat Hearts
• Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF4 Plasmas
• Heat Transport Simulation for Atmospheric-Pressure High-Density Microgap Plasma
• Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
• High-Spatial-Resolution Multichannel Thomson Scattering Measurements for Atmospheric Pressure Microdischarge
• CW Laser Oscillation of Visible and Near-Infrared Hg(II) Lines in a He-Hg Positive Column Discharge
• CW Laser Oscillation of Cd(II) and I(II) Lines in a He-CdI_2 Positive Column Discharge
• Reaction Rates for the Chemiluminescence of Cypridina Luciferin Analogues with Superoxide : A Quenching Experiment with Superoxide Dismutase(Organic Chemistry)
• Dilution-Gas Effect on Electron Density and Temperature in RF SiH_4 Plasma Based on Microwave Cavity Resonance Measurement
• Laser-Induced-Fluorescence Study of the SiH_2 Density in RF SiH_4 Plasmas with Xe, Ar, He, and H_2 Dilution Gases
• Effect of Dilution Gases on the SiH_3 Radical Density in an RF SiH_4 Plasma ( Plasma Processing)
• Laser-Induced-Fluorescence Detection of SiH_2 Radicals in a Radio-Frequency Silane Plasma
• Level Excitation Cross Sections of Atomic Fragments in Low-Energy Electron Impact Dissociation of Group IV Hydrides
• Synthesis of Fluorinated SiN_x Gate Dielectric Films Using ECR-PECVD Employing SiF_4/N_2/H_2 Gases
• Ultrathin Fluorinated Silicon Nitride Gate Dielectric Films Formed by Plasma Enhanced Chemical Vapor Deposition Employing NH_3 and SiF_4
• Control of Ion Bombardment and Species for Ultra Low Temperature Formation of Silicon Nitride Gate Dielectric Films Using Plasma Chemical Vapor Deposition
• Population Densities of He Excited States in a Positive Column Discharge Used for the He-Cd^+ Laser
• On the Determination of the Electron Density in a Positive Column He-Metal Laser Discharge Having a Non-Maxwellian Electron Energy Distribution
• Determination of the Penning Excitation Cross Sections of Mg Atoms by He,Ne and Ar Metastable Atoms
• Penning Excitation Cross Sections for the Individual Zn (II) States by He 2^1S and He 2^3S Metastable Atoms
• A Property of Noise in the Retarding Field Energy Analyzer
• Widely Wavelength Tunable Ultrashort Soliton Pulse and Anti-Stokes Pulse Generation for Wavelengths of 1.32-1.75 μm
• A Flash Lamp with Toroidal Discharge Excitation
• Anomalous Saturation Characteristics of Output Powers of Ar^+ Ion Lasers and Influence of Pinch Effects
• Measurement of Chromatic Dispersion of Optical Fibers Using Wavelength-Tunable Soliton Pulses
• Analysis of Widely Wavelength Tunable Femtosecond Soliton Pulse Generation Using Optical Fibers
• Radical Behavior in Fluorocarbon Plasma and Control of Silicon Oxide Etching by Injection of Radicals
• Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation
• Widely Broadened Super Continuum Generation Using Highly Nonlinear Dispersion Shifted Fibers and Femtosecond Fiber Laser
• Generation of Squeezed Vacuum Using Wavelength-Tunable Soliton Pulse and Nonlinear Polarization Interferometer
• Emission Cross Sections of Excited Fragments Produced by 0-100 eV Electron Impact on SiH_4 : Application of the "He Standard"
• Growth of Carbon Nanotubes by Microwave-excited Non-Equilibrium Atmospheric-Pressure Plasma
• Generation of Squeezed Vacuum using Spectral Filter by Spatial Light Modulator and Nonlinear Polarization Interferometer
• Roles of SiH3 and SiH2 Radicals in Particle Growth in rf Silane Plasmas
• Development and Characterization of a New Compact Microwave Radical Beam Source
• High-Peak-Power Ultrashort Pulse Generation Using All-Fiber Chirped Pulse Amplification System with Small Core Multimode Fiber
• Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH4 Plasma with Ar, N2, and H2 Dilution Gases
• Cypridina Luciferin Analog Reduces the Incidence of Ischemia/Reperfusion-Induced Ventricular Fibrillation.
• Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
• Plasma Induced Subsurface Reactions for Anisotropic Etching of Organic Low Dielectric Film Employing N2 and H2 Gas Chemistry
• Emission Cross Sections of the Fragments in Dissociative Excitation of Germane by Electron Impact

もっと見る 閉じる

スポンサーリンク