Barrier Properties for Oxygen Diffusion in a TaSiN Layer

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-07-15

著者

• Kudo Jun

  Central Research Laboratories Sharp Corporation

• HARA Tohru

  Electrical Engineering, Hosei University

• Hara Tohru

  Electrical Engineering Hosei University

• Tanaka M

  Toshiba Corp. Kawasaki Jpn

• TANAKA Masaru

  Electrical Engineering, Hosei University

• SAKIYAMA Keizo

  LSI R&D, IC Division, Sharp Corporation

• ONISHI Shigeo

  LSI R&D, IC Division, Sharp Corporation

• ISHIHARA Kazuya

  LSI R&D, IC Division, Sharp Corporation

• KUDO Jun

  LSI R&D, IC Division, Sharp Corporation

• SAKIYAMA Keizo

  LSI R&D, IC Division, Sharp Corporation

• KUDO Jun

  LSI R&D, IC Division, Sharp Corporation

• ONISHI Shigeo

  LSI R&D, IC Division, Sharp Corporation

• ISHIHARA Kazuya

  LSI R&D, IC Division, Sharp Corporation

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