KUDO Jun | LSI R&D, IC Division, Sharp Corporation

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概要

• 同名の論文著者
• LSI R&D, IC Division, Sharp Corporationの論文著者

関連著者

• Kudo Jun

  Central Research Laboratories Sharp Corporation

• HARA Tohru

  Electrical Engineering, Hosei University

• Hara Tohru

  Electrical Engineering Hosei University

• Tanaka M

  Toshiba Corp. Kawasaki Jpn

• TANAKA Masaru

  Electrical Engineering, Hosei University

• SAKIYAMA Keizo

  LSI R&D, IC Division, Sharp Corporation

• ONISHI Shigeo

  LSI R&D, IC Division, Sharp Corporation

• ISHIHARA Kazuya

  LSI R&D, IC Division, Sharp Corporation

• KUDO Jun

  LSI R&D, IC Division, Sharp Corporation

• SAKIYAMA Keizo

  LSI R&D, IC Division, Sharp Corporation

• KUDO Jun

  LSI R&D, IC Division, Sharp Corporation

• ONISHI Shigeo

  LSI R&D, IC Division, Sharp Corporation

• ISHIHARA Kazuya

  LSI R&D, IC Division, Sharp Corporation

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著作論文

• Barrier Properties for Oxygen Diffusion in a TaSiN Layer

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