Properties of Titanium Nitride Films for Barrier Metal in Aluminum Ohmic Contact Systems
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-07-15
著者
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原 徹
法政大 工
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HARA Tohru
Electrical Engineering, Hosei University
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Hara T
Kanagawa Univ. Yokohama Jpn
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Hara Tohru
Electrical Engineering Hosei University
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INOUE Ken
Electrical Engineering, Hosei University
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NAKAMURA Shigeaki
M. SETEK Co., Lid.
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YAMANOUE Akira
Electrical Engineering, Hosei University Koganei
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IIO Hiroki
Electrical Engineering, Hosei University Koganei
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WASHIDZU Gen
Electrical Engineering, Hosei University Koganei
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Iio Hiroki
Electrical Engineering Hosei University Koganei
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Washidzu Gen
Electrical Engineering Hosei University
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Washidzu Gen
Electrical Engineering Hosei University Koganei
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Yamanoue Akira
Electrical Engineering Hosei University Koganei
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Inoue K
Biological Institute And Herbarium Faculty Of Science Shinshu University
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