NAKAMURA Shigeaki | M. SETEK Co., Lid.
スポンサーリンク
概要
関連著者
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原 徹
法政大 工
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HARA Tohru
Electrical Engineering, Hosei University
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Hara T
Kanagawa Univ. Yokohama Jpn
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Hara Tohru
Electrical Engineering Hosei University
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INOUE Ken
Electrical Engineering, Hosei University
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NAKAMURA Shigeaki
M. SETEK Co., Lid.
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Inoue K
Biological Institute And Herbarium Faculty Of Science Shinshu University
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Chen Shih-chang
Vlsi R&d Center Oki Electric Industry Co. Ltd.
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ENDO Nobuyuki
National Agricultural Research Center for Kyushu Okinawa Region (KONARC)
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TAMURA Hiroyuki
VLSI R&D Center, Oki Electric Industry Co. Ltd.
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KINOSHITA Kei
Electrical Engineering, Hosei University
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ENDO Nobuyuki
Electrical Engineering, Hosei University
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YAMANOUE Akira
Electrical Engineering, Hosei University Koganei
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IIO Hiroki
Electrical Engineering, Hosei University Koganei
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WASHIDZU Gen
Electrical Engineering, Hosei University Koganei
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Chen S‐c
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Iio Hiroki
Electrical Engineering Hosei University Koganei
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Washidzu Gen
Electrical Engineering Hosei University
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Washidzu Gen
Electrical Engineering Hosei University Koganei
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Kinoshita K
Assoc. Super‐advanced Electronics Technol. Yokohama Jpn
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Yamanoue Akira
Electrical Engineering Hosei University Koganei
著作論文
- Formation of Titanium Nitride/Titanium Silicide by High Pressure Nitridation in Titanium/Silicon
- Properties of Titanium Nitride Films for Barrier Metal in Aluminum Ohmic Contact Systems