Fine-Grained SrBi_2Ta_2O_9 Thin Films by Low Temperature Annealing
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Kudo Jun
Central Research Laboratories Sharp Corporation
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Kudo J
Semiconductor Technol. Academic Res. Center Yokohama Jpn
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Kudo Jun
Department Of Biotechnology Tottori University
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Ito Yasuyuki
Functional Devices Laboratories Sharp Corporation
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NAGATA Masaya
Functional Devices Laboratories, Sharp Corporation
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Ishihara Kazuya
Functional Devices Research Laboratories Sharp Corporation
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OGATA Nobuhito
Functional Devices Research Laboratories, Sharp Corporation
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URASHIMA Hitoshi
Functional Devices Research Laboratories, Sharp Corporation
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OKUTOH Akira
Functional Devices Research Laboratories, Sharp Corporation
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YAMAZAKI Shinobu
Functional Devices Research Laboratories, Sharp Corporation
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MITARAI Shun
Functional Devices Research Laboratories, Sharp Corporation
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KUDO Jun
Functional Devices Research Laboratories, Sharp Corporation
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Okutoh Akira
Functional Devices Research Laboratories Sharp Corporation
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Mitarai Shun
Functional Devices Research Laboratories Sharp Corporation
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Nagata M
Sharp Corp. Nara Jpn
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Nagata Masaya
Functional Devices Development Center Sharp Corporation
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Ogata N
Sharp Corp. Chiba Jpn
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Ogata Nobuhito
Functional Devices Development Center Sharp Corporation
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Ishihara Kazuya
Vlsi Development Laboratories Sharp Corporation
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Urashima Hitoshi
Functional Devices Research Laboratories Sharp Corporation
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Yamazaki Shinobu
Functional Devices Research Laboratories Sharp Corporation
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Ito Yasuyuki
Functional Devices Laboratories, Sharp Corporation
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Ishihara Kazuya
Functional Devices Laboratories, Sharp Corporation
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MITARAI Shun
Functional Devices Laboratories, Sharp Corporation
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- Fine-Grained SrBi_2Ta_2O_9 Thin Films by Low Temperature Annealing
- Fine-Grained SrBi_2Ta_2O_9 Thin Films by Low Temperature Annealing
- Crystallization of SrBi2Ta2O9 Thin Films in N2 Ambient by Chemical Solution Deposition Method