Preparation and Structural Analysis of Micro-patterned Pb(Zr,Ti)O3 Film by Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
Pb(Zr,Ti)O3 (PZT) films were prepared on Si substrates at 600 °C by metalorganic chemical vapor deposition (MOCVD). Crystallinity of tetragonal PZT film was dramatically increased by making Pt bottom electrode layer on the Si substrate. Based on this observation, we succeeded in directly patterning PZT films having quite different crystal quality, i.e., well-crystallized (100)-/(001)-preferentially-oriented ones, and poorly-crystallized randomly-oriented ones, by pre-patterning Pt bottom electrodes. The achievement of the patterning of PZT films down a size of 1 μm was determined by scanning probe microscopy using a piezoresponse technique. As a result, we demonstrated the direct patterning of PZT films on Si substrates for the first time and introduced the possibility of directly patterning PZT films with good piezoelectric properties without post-deposition processes such as etching.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-06-15
著者
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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OHASHI Naoki
National Institute for Material Science
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KIMURA Shigeru
Materials Science Division, Japan Synchrotron Radiation Research Institute (JASRI, SPring-8)
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Nishida Ken
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Haneda Hajime
National Institute For Material Science
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Minamidate Jun
Department Of Innovative And Engineered Materials Tokyo Institute Of Technology
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Katoda Takashi
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Okamoto Shoji
Department Of Dermatology School Of Medicine Chiba University
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Saito Keisuke
Bruker Axs K. K.
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Yokoyama Shintaro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagai Atsushi
Department Of Internal Medicine-1 Tokyo Women's Medical University
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Takahashi Kenji
Department Of Applied Biological Chemistry Graduate School Of Agriculture Kinki University
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Sakata Osami
Materials Science Division, Japan Synchrotron Radiation Research Institute (JASRI, SPring-8), 1-1-1 Kouto, Mikazuki, Hyogo 679-5198, Japan
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Sakata Osami
Materials and Structure Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori, Yokohama 226, Japan
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Saito Keisuke
Bruker AXS K.K., 3-9-A Moriya, Yokoyama 221-0022, Japan
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Takahashi Kenji
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Nishida Ken
Department of Electronic and Photonic Systems Engineering, Kochi University of Technology, 185 Miyanokuchi, Tosayamada, Kami-gun, Kochi 782-8502, Japan
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Nishida Ken
Department of Communicating Engineering, National Defense Academy, Yokosuka, Kanagawa 239-8686, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Okamoto Shoji
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Katoda Takashi
Department of Electronic and Photonic System Engineering, Kochi University of Technology, 185 Tosayamada-cho, Kami, Kochi 782-8502, Japan
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Minamidate Jun
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Nagai Atsushi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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