RF Magnetron Sputtering Growth of Epitaxial SrRuO3 Films with High Conductivity
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概要
- 論文の詳細を見る
SrRuO3 films were grown on (001)SrTiO3 single crystal substrates by rf magnetron sputtering under various total pressures, and their crystal structure, room temperature resistivity, and temperature dependency of resistivity were investigated. High-resolution X-ray diffraction (XRD) analysis revealed that the unit cell volume of these films decreased with increasing total pressure from 1.3 to 27 Pa and was almost constant above 27 Pa corresponding to that of bulk SrRuO3. SrRuO3 films deposited under a total pressure of 27 Pa showed the lowest room temperature resistivity, i.e., 250 μ$\Omega$$\cdot$cm, almost the same as the reported one of the SrRuO3 single crystal. This film also showed a positive temperature dependency of resistivity with a temperature dependency change at about 150 K, which was also in good agreement with the reported one of the SrRuO3 single crystal.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-10-30
著者
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Sakai Joe
School Of Materials Science Japan Advanced Institute Of Science And Technology (jaist)
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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AKIYAMA Kensuke
Kanagawa Industrial Technology Research Institute
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Nishida Ken
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Katoda Takashi
Department Of Electronic And Photonic Systems Engineering Kochi University Of Technology
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Kamo Takafumi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatuda, Midori-ku, Yokohama 226-8503, Japan
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Kamo Takafumi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-1508, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, J2-1508, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
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Nishida Ken
Department of Communicating Engineering, National Defense Academy, Yokosuka, Kanagawa 239-8686, Japan
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Akiyama Kensuke
Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Katoda Takashi
Department of Electronic and Photonic System Engineering, Kochi University of Technology, 185 Tosayamada-cho, Kami, Kochi 782-8502, Japan
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