Electrical Properties of (Ca,Sr)Bi4Ti4O15 Thin Films Fabricated Using a Chemical Solution Deposition Method
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概要
- 論文の詳細を見る
Thin films of calcium-strontium bismuth titanate (Ca1-xSrx)Bi4Ti4O15 solid solution were fabricated on (111)Pt/Ti/SiO2/(100)Si substrates by a chemical-solution deposition (CSD) technique. These films had $x = 0--1.00$ and consisted of a polycrystalline structure with random orientation of the bismuth layer-structured ferroelectric (BLSF) crystal ($m = 4$). The relative dielectric constants of (Ca1-xSrx)Bi4Ti4O15 films were enhanced from 40 to 220 with increasing $x$; these values did not vary significantly with changes in the measuring frequency and the bias field. The temperature coefficient of the relative dielectric constant at around room temperature became larger with increasing $x$ from 0 to 1.00; the change in the dielectric constant of these film between 30–100°C increased from 2% to 15%.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-09-15
著者
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Funakubo Hiroshi
Department Of Innovative And Engineered Materials
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Iijima Takashi
Smart Structure Research Center Aist
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Okada Isao
Department Of Chemistry Faculty Of Science And Engineering Sohia University
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Sakurai Keiko
Department Of Chemistry Sophia University
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Uchida Hiroshi
Department Of Anesthesia Tottori Prefectural Central Hospital
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Kojima Takashi
Department Of Applied Chemistry And Biotechnology Chiba University
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Watanabe Takayuki
Department Of Biochemistry School Of Dentistry Hokkaido University
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Uchida Hiroshi
Department of Chemistry, Sophia University, Tokyo 102-8554, Japan
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Matsuda Hirofumi
Smart Structure Research Center, AIST
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Matsuda Hirofumi
Smart Structure Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8568, Japan
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Watanabe Takayuki
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Sakurai Keiko
Department of Chemistry, Sophia University, Tokyo 102-8554, Japan
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Funakubo Hiroshi
Department of Innovative and Engineered Material, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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Okada Isao
Department of Chemistry, Sophia University, Tokyo 102-8554, Japan
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Kojima Takashi
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohama 226-8503, Japan
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