Analysis of an Oxygen Dissolution Process Concerning Czochralski (CZ) Si Crystal Growth using the Sessile Drop Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-02-15
著者
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Sakai S
Tokushima Univ. Tokushima Jpn
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Sakai S
Electrotechnical Lab. Ibaraki
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Huang X
Nanjing Univ. Nanjing Chn
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HUANG Xinming
Faculty of Education, Shinshu University
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HOSHIKAWA Keigo
Faculty of Education, Shinshu University
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SANPEI Keiko
Nanwa Quarts Inc.
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SAITOU Keijirou
Faculty of Education, Shinshu University
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SAKAI Susumu
Department of Materials Science and Chemical Engineering, Shizuoka University
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TERASHIMA Kazutaka
Shonan Institute of Technology
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Saitou Keijirou
Faculty Of Education Shinshu University
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Hoshikawa Keigo
Faculty Of Education Shinshu University
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Huang Xinming
Faculty Of Education Shinshu University
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