HUANG Xinming | Faculty of Education, Shinshu University
スポンサーリンク
概要
関連著者
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Huang X
Nanjing Univ. Nanjing Chn
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HUANG Xinming
Faculty of Education, Shinshu University
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HOSHIKAWA Keigo
Faculty of Education, Shinshu University
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Huang Xinming
Faculty Of Education Shinshu University
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Hoshikawa Keigo
Faculty Of Education Shinshu University
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干川 圭吾
信州大
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TERASHIMA Kazutaka
湘南工科大学工学部材料工学科
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KIMURA Shigeyuki
木村融液動態プロジェクト
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干川 圭吾
信州大学教育学部教育実践研究指導センター
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TAISHI Toshinori
Faculty of Education, Shinshu University
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TERASHIMA Kazutaka
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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KIMURA Shigeyuki
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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Taishi Toshinori
Faculty Of Engineering Shinshu University
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Kimura Shigeyuki
Kimura Metamelt Project
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Terashima Kazutaka
Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium
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干川 圭吾
信州大学教育学部
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Taishi Toshinori
Faculty of Engineering, Shinshu University
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Sakai S
Tokushima Univ. Tokushima Jpn
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Sakai S
Electrotechnical Lab. Ibaraki
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HUANG Xinming
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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TERASHIMA Kazutaka
Shonan Institute of Technology
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Izunome K
Toshiba Ceramics Co. Ltd. Tokyo Jpn
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HUANG Xinming
Kimura METAMELT Project, ERATO, JRDC
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深海 龍夫
信州大学工学部電気電子工学科
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FUKAMI Tatsuo
Faculty of Engineering, Shinshu University
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Sasaki H
Univ. Tsukuba Ibaraki Jpn
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SASAKI Hitoshi
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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TOKIZAKI Eiji
Kimura Metamelt Project, ERATO, JRDC
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Fukami Tatsuo
Faculty Of Engineering Shinshu University
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Sasaki Hajime
Semiconductor Group Mitsubishi Electric Corporation
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Sasaki Hideyuki
R&d Center Toshiba Corp.
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Sasaki Hitoshi
Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium
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Sasaki H
Semiconductor Group Mitsubishi Electric Corporation
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Sasaki H
Electrotechnical Laboratory
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KAJIGAYA Tomio
Sumitomo Metal Mining Co., Ltd.
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Tokizaki Eiji
Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium
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Kajigaya Tomio
Sumitomo Metal Mining Co. Ltd.
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SAKAI Shiro
Department of Electrical and Electronic Engineering, University of Tokushima
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Sakai S
Department Of Electrical And Electronic Engineering The University Of Tokushima
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Sakai S
Electrotechnical Lab. Ibaraki Jpn
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Sakai S
Department Of Electric And Computer Engineering Nagoya Institute Of Technology
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Sakai S
Department Of Electrical And Electronic Engineering The University Of Tokushinna
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Anzai Yutaka
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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Sakai S
Department Of Electrical And Electronic Engineering Tokushima University
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Sakai Shiro
Graduate School Of Engineering The University Of Tokushima
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Sakai S
Faculty Of Education Shinshu University:(present Address)department Of Materials Science And Chemica
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Kimura S
Ntt Photonics Lab. Kanagawa Jpn
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Anzai Y
Storage Technology Research Center Research & Development Group Hitachi Ltd.
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Sakai S
Sci. Univ. Tokyo Tokyo Jpn
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SAKAI Susumu
Faculty of Education, Shinshu University
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SANPEI Keiko
Nanwa Quarts Inc.
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SAITOU Keijirou
Faculty of Education, Shinshu University
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SAKAI Susumu
Department of Materials Science and Chemical Engineering, Shizuoka University
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KUBOTA Masayoshi
Sumitomo Metal Mining Co., Ltd.
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IZUNOME Koji
Kimura METAMELT Project, ERATO, JRDC
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Izunome Koji
Kimura Metamelt Project Erato Jrdc Tsukuba Research Consortium
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Kubota M
Sumitomo Metal Mining Co. Ltd.
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Okano Yasunori
Department of Materials Engineering Science, Osaka University
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HUANG Xin
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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Huan Xinming
Kimura Metamelt Project, ERATO, JRDC, Tsukuba Research Consortium
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YONENAGA Ichiro
Institute for Materials Research, Tohoku University
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HOSHIKAWA Keigo
Institute for Materials Research, Tohoku University
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Iino T
Sumitomo Metal Mining Co. Ltd.
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Oishi Shuji
Faculty Of Engineering Shinshu University
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KISHI Hiroshi
Faculty of Engineering, Shinshu University
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WATANABE Hiroyuki
Nanwa Quarts Inc.
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Saitou Keijirou
Faculty Of Education Shinshu University
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IINO Takayuki
Sumitomo Metal Mining Co., Ltd.
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Hoshikawa Keigo
Institute For Materials Research Tohoku University
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Nakazawa Tatsuo
Nagano National College of Technology
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YAMAHARA Keiji
Yokohama Research Center, Mitsubishi Chemical Corporation
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SAKA Susumu
Faculty of Education, Shinshu University
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UTSUNOMIYA Akira
Yokohama Research Center, Mitsubishi Chemical Corporation
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TSURITA Yasushi
Yokohama Research Center, Mitsubishi Chemical Corporation
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YONENAGA Ichiro[
Faculty of Education, Shinshu University
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WANG Tiefeng
Faculty of Education, Shinshu University
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YAMAHARA Keiji
Mitsubishi Chemical Corporation
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HUANG Xinming
木村融液動態プロジェクト
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IZUNOME Koji
木村融液動態プロジェクト
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WHITBY Evan
Chimera Technologies
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HUANG Xinming
Tsukuba Research Consortium
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TERASHIMA Kazutaka
Tsukuba Research Consortium
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IZUNOME Koji
Tsukuba Research Consortium
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KIMURA Shigeyuki
Tsukuba Research Consortium
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Okano Y
Shizuoka Univ. Hamamatsu Jpn
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Whitby E
イノベーティブリサーチインク
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Wang Tiefeng
Faculty Of Education Shinshu University
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Kishi Hiroshi
Faculty Of Engineering Shinshu University
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Yonenaga Ichiro[
Faculty Of Education Shinshu University
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Yonenaga Ichiro
Institute for Material Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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TAISHI Toshinori
Faculty of Education, Shinshu University:(Permanent address)Faculty of Engineering, Shinshu University
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Okano Yasunori
Department of Chemical Engineering, Waseda University
著作論文
- Temperature Dependence of the Viscosity of Molten Silicon Measured by the Oscillating Cup Method
- Surface Tension Variation of Molten Silicon Measured by the Ring Method
- Evaporation of Oxygen-Bearing Species from Si Melt and Influence of Sb Addition
- Development of a Sessile Drop Method Concerning Czochralski Si Crystal Growth
- Expansion Behavior of Bubbles in Silica Glass Concerning Czochralski (CZ) Si Growth
- Analysis of Oxygen Evaporation Rate and Dissolution Rate Concerning Czochralski Si Crystal Growth : Effect of Ar Pressure
- Analysis of an Oxygen Dissolution Process Concerning Czochralski (CZ) Si Crystal Growth using the Sessile Drop Method
- Dislocation-Free Czochralski Silicon Crystal Growth without the Dislocation-Elimination-Necking Process
- Surface of Silica Glass Reacting with Silicon Melt: Effect of Raw Materials for Silica Crucibles
- Dislocation-Free Czochralski Silicon Crystal Growth without Dash Necking
- Dislocation-Free Czochralski Si Crystal Growth without Dash Necking Using a Heavily B and Ge Codoped Si Seed
- In Situ Observation of the Interfacial Phase Formation at Si Melt/Silica Glass Interface
- Dislocation-Free Czochralski Si Crystal Growth without the Dash-Necking Process : Growth from Undoped Si Melt
- Heavily Boron-Doped Silicon Single Crystal Growth:Constitutional Supercooling
- SiO Vapor Pressure in an SiO_2 Glass/Si Melt/SiO Gas Equilibrium System
- Heavily Boron-Doped Silicon Single Crystal Growth: Boron Segregation
- Silicon Crystal Growth under Equilibrium Condition of SiO_2-Si-SiO System: Equilibrium Oxygen Segregation Coefficient
- Chemical Reaction of Sb Atoms in Si Melt
- Chermieal Reaction of Sb Atoms in Si Melt
- Evaporatiorn Rates of Oxides from Undoped and Sb-Doped Si Melts under Atmospheres of Pure Ne, Ar, and Kr
- Effect of Background Gas Pressure on Evaporation of Oxides from Sb-Doped Si Melt
- Relationship between Different Interfacial Phases and Oxygen Solubility in Silicon Melt