TAISHI Toshinori | Faculty of Education, Shinshu University

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概要

• 同名の論文著者
• Faculty of Education, Shinshu Universityの論文著者

関連著者

• TAISHI Toshinori

  Faculty of Education, Shinshu University

• Huang X

  Nanjing Univ. Nanjing Chn

• HOSHIKAWA Keigo

  Faculty of Education, Shinshu University

• Hoshikawa Keigo

  Faculty Of Education Shinshu University

• HUANG Xinming

  Faculty of Education, Shinshu University

• Huang Xinming

  Faculty Of Education Shinshu University

• 干川 圭吾

  信州大

• Taishi Toshinori

  Faculty Of Engineering Shinshu University

• 干川 圭吾

  信州大学教育学部

• 干川 圭吾

  信州大学教育学部教育実践研究指導センター

• Taishi Toshinori

  Faculty of Engineering, Shinshu University

• HUANG Xinming

  Silicon Technology Corporation

• 深海 龍夫

  信州大学工学部電気電子工学科

• FUKAMI Tatsuo

  Faculty of Engineering, Shinshu University

• Fukami Tatsuo

  Faculty Of Engineering Shinshu University

• KAJIGAYA Tomio

  Sumitomo Metal Mining Co., Ltd.

• Kajigaya Tomio

  Sumitomo Metal Mining Co. Ltd.

• 干川 圭吾

  信州大学大学院工学系研究科電気電子工学専攻

• Nakanishi Masami

  Silicon Technology Corporation

• SATO Tsuyoshi

  Silicon Technology Corporation

• YANG Deren

  State Key Lab of Si Materials, Zhejiang University

• KUBOTA Masayoshi

  Sumitomo Metal Mining Co., Ltd.

• Kubota M

  Sumitomo Metal Mining Co. Ltd.

• YONENAGA Ichiro

  Institute for Materials Research, Tohoku University

• HOSHIKAWA Keigo

  Institute for Materials Research, Tohoku University

• Iino T

  Sumitomo Metal Mining Co. Ltd.

• IINO Takayuki

  Sumitomo Metal Mining Co., Ltd.

• YU Xuegong

  Faculty of Education, Shinshu University

• Yu Xuegong

  Faculty Of Education Shinshu University

• Hoshikawa Keigo

  Institute For Materials Research Tohoku University

• YONENAGA Ichiro[

  Faculty of Education, Shinshu University

• WANG Tiefeng

  Faculty of Education, Shinshu University

• YAMAHARA Keiji

  Mitsubishi Chemical Corporation

• Wang Tiefeng

  Faculty Of Education Shinshu University

• Yonenaga Ichiro[

  Faculty Of Education Shinshu University

• Nakanishi Masami

  Silicon Technology Corporation, 897-20 Kyowa Mochizuki, Kitasaku-Gun, Nagano 384-2204, Japan

• Hoshikawa Keigo

  Faculty of Education, Shinshu University, Nishinagano, Nagano 380-8544, Japan

• Yonenaga Ichiro

  Institute for Material Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

• TAISHI Toshinori

  Faculty of Education, Shinshu University:(Permanent address)Faculty of Engineering, Shinshu University

• Taishi Toshinori

  Faculty of Education, Shinshu University, Nishinagano, Nagano 380-8544, Japan

• Yang Deren

  State Key Lab of Si Materials, Zhejiang University, Hangzhou 310027, People's Republic of China

• Yu Xuegong

  Faculty of Education, Shinshu University, Nishinagano, Nagano 380-8544, Japan

• Huang Xinming

  Silicon Technology Corporation, 897-20 Kyowa, Mochizuki, Kitasaku-Gun, Nagano 384-2204, Japan

• Huang Xinming

  Silicon Technology Corporation, 897-20 Kyowa Mochizuki, Kitasaku-Gun, Nagano 384-2204, Japan

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著作論文

• Dislocation-Free Czochralski Silicon Crystal Growth without the Dislocation-Elimination-Necking Process
• High Strength Si Wafers with Heavy B and Ge Codoping
• Dislocation Formation in Czochralski Si Crystal Growth Using an Annealed Heavily B-Doped Si Seed
• Dislocation-Free Czochralski Silicon Crystal Growth without Dash Necking
• Dislocation-Free Czochralski Si Crystal Growth without Dash Necking Using a Heavily B and Ge Codoped Si Seed
• In Situ Observation of the Interfacial Phase Formation at Si Melt/Silica Glass Interface
• Dislocation-Free Czochralski Si Crystal Growth without the Dash-Necking Process : Growth from Undoped Si Melt
• Heavily Boron-Doped Silicon Single Crystal Growth:Constitutional Supercooling
• Heavily Boron-Doped Silicon Single Crystal Growth: Boron Segregation
• Dislocation Formation in Czochralski Si Crystal Growth Using an Annealed Heavily B-Doped Si Seed
• High Strength Si Wafers with Heavy B and Ge Codoping

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