スパッタ法による磁性薄膜堆積過程のシミュレーション

概要

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A computer simulation method for sputter deposition processes is introduced, and some of the simulated results obtained are presented. The effects of sputter-deposition parameters such as the sputtering gas pressure, substrate temperature, and high-energy particle bonbardment of the film surface on the microstructure of magnetic thin films were investigated by computer simulation. Changes in the sputtering gas pressure led to change not only in the distribution of the incidence angles and the energy distribution of deposited particles, but also in the film composition. Surface migration of the deposited atoms due to thermally activated hopping led to a considerable increase in film density. High-energy particle bonbardment of the film surface induced movement and re-solidification of the deposited atoms in the film, which resulted in the formation of voids.
社団法人日本磁気学会の論文
1998-07-01