Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure <30>^Silicon/Natural Silicon Heterostructures

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-06-15

著者

• Matsumoto Satoru

  Department of Cardiology, Toyonaka Municipal Hospital

• Abe Takumi

  Department Of Advanced Materials Science Graduate School Of Frontier Sciences University Of Tokyo

• MUROTA Junichi

  Research Institute of Electrical Communication, Tohoku University

• Matsumoto S

  Faculty Of Science And Technology Keio University

• Matsumoto Satoru

  Department Of Electronics And Electrical Engineering Keio University

• Abe Takao

  Isobe R&d Center Shin-etsu Handotai

• Wada K

  Osaka Prefecture University

• NAKABAYASHI Yukio

  Department of Electronics and Electrical Engineering, Keio University

• OSMAN Hirman

  Department of Electronics and Electrical Engineering, Keio University

• TOYONAGA Kazunari

  Department of Electronics and Electrical Engineering, Keio University

• YOKOTA Kaori

  Department of Electronics and Electrical Engineering, Keio University

• WADA Kazaumi

  Department of Materials Science and Engineering, Massachusetts Institute of Technology

• Wada Kazuhiro

  Department Of Nuclear Engineering Faculty Of Engineering Kyoto University

• Matsumoto S

  Department Of Electronics And Electrical Engineering Keio University

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