Low-Pressure Metalorganic Chemical Vapor Deposition of CuAlSe_2 Epitaxial Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-12-30

著者

• Isomura S

  Ehime Univ. Ehime Jpn

• SHIRAKATA Sho

  Faculty of Engineering Science, Osaka University

• CHICHIBU Shigefusa

  Institute of Applied Physics, University of Tsukuba

• Matsumoto S

  Faculty Of Science And Technology Keio University

• Matsumoto Satoru

  Department Of Electronics And Electrical Engineering Keio University

• MATSUMOTO Satoru

  Faculty of Science and Technology, Keio University

• ISOMURA Shigehiro

  Faculty of Engineering Ehime University

• Harada Y

  Univ. Tokyo Tokyo Jpn

• Harada Yoshinao

  Ulsi Process Technology Development Center Matsushita Electronics Corporation

• Harada Yoshinao

  Ulsi Process Technology Development Center Matsushita Electronics Corp.

• CHICHIBU Shigefusa

  Faculty of Science and Technology, Science University of Tokyo

• UCHIDA Mei

  Faculty of Science and Technology, Keio University

• HARADA Yoshiyuki

  Faculty of Science and Technology, Keio University

• HIGUCHI Hirofumi

  Bentec Corporation

• SUDO Ryo

  Faculty of Science and Technology, Keio University

• Sudo Ryo

  Faculty Of Science And Technology Keio University

• Harada Y

  Life Culture Department Seitoku University

• Matsumoto S

  Ntt Telecommunications Energy Laboratories

• Shirakata Sho

  Faculty Of Engineering Ehime University

• Chichibu S

  Institute Of Applied Physics University Of Tsukuba

• Chichibu S

  Institute Of Applied Physics And Graduate School Of Pure And Applied Sciences University Of Tsukuba

• Higuchi H

  Matsushita Battery Industrial Co. Ltd. Osaka Jpn

• Uchida M

  Matsushita Electric Industrial Co. Ltd. Kyoto Jpn

• Matsumoto Satoru

  Faculty Of Science And Technology Keio University

• ISOMURA Shigehiro

  Faculty of Engineering , Ehime University

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