Use of Tetraethylgermane in ArF Excimer Laser Chemical Vapor Deposition of Amorphous Silicon-Germanium Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-05-15

著者

• CHICHIBU Shigefusa

  Institute of Applied Physics, University of Tsukuba

• Matsumoto S

  Faculty Of Science And Technology Keio University

• Matsumoto Satoru

  Department Of Electronics And Electrical Engineering Keio University

• MATSUMOTO Satoru

  Faculty of Science and Technology, Keio University

• CHICHIBU Shigefusa

  Faculty of Science and Technology, Science University of Tokyo

• HIGUCHI Hirofumi

  Bentec Corporation

• Matsumoto S

  Ntt Telecommunications Energy Laboratories

• Ishihara Fujio

  Faculty of Science and Technology, Keio University

• Uji Hiroshi

  Faculty of Science and Technology, Keio University

• Kamimura Tatsuya

  Faculty of Science and Technology, Keio University

• Uji Hiroshi

  Faculty Of Science And Technology Keio University

• Ishihara Fujio

  Faculty Of Science And Technology Keio University:(present Address)toshiba Corporation

• Kamimura Tatsuya

  Faculty Of Science And Technology Keio University:(present Address)komatsu Corporation

• Chichibu S

  Institute Of Applied Physics University Of Tsukuba

• Chichibu S

  Institute Of Applied Physics And Graduate School Of Pure And Applied Sciences University Of Tsukuba

• Higuchi H

  Matsushita Battery Industrial Co. Ltd. Osaka Jpn

• Matsumoto Satoru

  Faculty Of Science And Technology Keio University

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