Abe Takao | Isobe R&d Center Shin-etsu Handotai

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著作論文

Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure ^Silicon/Natural Silicon Heterostructures
Self-Diffusion in Extrinsic Silicon Using Isotopically Enriched ^Si Layer : Semiconductors
Epitaxial Growth of Pure ^Si Layers on a Natural Si(100) Substrate Using Enriched ^SiH_4
Contribution of Polished Surface Waviness to Final SOI Thickness Uniformity of Bonded Wafers through PACE Process (Special Issue on SOI Devices and Their Process Technologies)
Creation of Bonded SOI Substrates with CZ Silicon Higher than 1000Ωcm in Resistivity
COP-Free Silicon Surfaces by Rapid Thermal Annealing (RTA) in a H_2/Ar Mixture Ambient Using High Growth Rate Crystals
Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure 30Silicon/Natural Silicon Heterostructures

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